article·2019-05-07

Quantum interference effects in titanium nitride films at low temperatures

Manosi Roy, Nikhil Reddy Mucha, Rahul Ponnam, Panupong Jaipan, Onome Scott‐Emuakpor, Sergey Yarmolenko, Alak Kumar Majumdar, D. Kumar

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Abstract

Abstract Detailed electrical resistivity (ρ) measurements have been carried out in epitaxial TiN thin films in the temperature (T) range of 4 ≤ T ≤ 300 K in magnetic fields from 0 to 6 T. The ρ (T) data show distinct minima around 38 K, which remains unaffected by the external magnetic fields. At higher temperatures (100−300K), the ρ(T) behavior was found to be linear in agreement with classical electron-phonon interactions (∝T). Below the minima, the ρ(T) is unequivocally described by the quantum interference effect (∝ − T ). The value of the coefficient of the T term matches well with the near-universal value.
Source: openaire · Quality: candidate unverified · Source record ↗

Research context

OpenAlex topics: Metal and Thin Film Mechanics · Semiconductor materials and devices · GaN-based semiconductor devices and materials

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