article·1994-04-01

Chemical vapour deposition of hafnium carbide and characterization of the deposited layers by secondary-neutral mass spectrometry

H. F. Ache, J. Goschnick, Martin Sommer, Gerhard Emig, Günter Schoch, O. Wormer

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OpenAlex topics: Semiconductor materials and devices · Diamond and Carbon-based Materials Research · Silicon Carbide Semiconductor Technologies

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