article·2011-07-10Open access

Structure and chemical bonds in reactively sputtered black Ti–C–N–O thin films

J.M. Chappé, M.C. Marco de Lucas, L. Cunha, C. Moura, J.F. Pierson, L. Imhoff, Olivier Heintz, V. Potin, S. Bourgeois, F. Vaz

Abstract

The evolution of the nanoscale structure and the chemical bonds formed in Ti–C–N–O films grown by reactive sputtering were studied as a function of the composition of the reactive atmosphere by increasing the partial pressure of an O 2 + N 2 gas mixture from 0 up to 0.4 Pa, while that of acetylene (carbon source) was constant. The amorphisation of the films observed by transmission electron microscopy was confirmed by micro-Raman spectroscopy, but it was not the only effect associated to the increase of the O 2 + N 2 partial pressure. The chemical environment of titanium and carbon, analysed by X-ray photoemission spectroscopy, also changes due to the higher affinity of Ti towards oxygen and nitrogen than to carbon. This gives rise to the appearance of amorphous carbon coexisting with poorly crystallized titanium oxynitride . The evolution of the films colour is explained on the basis of these structural changes.
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: Metal and Thin Film Mechanics · Semiconductor materials and devices · Advanced materials and composites

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References

Reference metadata was not supplied for this record.