journal article·2010-08

Mechanism of high selectivity in ceria based shallow trench isolation chemical mechanical polishing slurries

R. Manivannan, S. Noyel Victoria, S. Ramanathan

Thin Solid Films· Volume 518· Issue 20
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Abstract

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Research context

OpenAlex topics: Advanced Surface Polishing Techniques · Integrated Circuits and Semiconductor Failure Analysis · Diamond and Carbon-based Materials Research

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