One-step electrodeposition of CuGaSe2 thin films

Abstract CuGaSe 2 thin films have been prepared by one-step electrodeposition and rapid thermal annealing process. According to composition and morphology analysis, deposition potential of − 0.6 V vs. SCE is considered to be optimum for electrodeposition. From the X-ray diffraction and Raman studies, the as-deposited film exhibits poor crystallinity without the evidence of CuGaSe 2 or other Ga-containing phases, while the rapid thermal annealing-treated film shows chalcopyrite structure CuGaSe 2 phase containing MoSe 2 phase between the Mo substrate and the absorber and minor second phase Cu 2 − x Se. The obtained CuGaSe 2 thin film has a band gap of about 1.68 eV and p-type conductivity.