journal article·2011-09

Thermal conductivity and sound velocity measurements of plasma enhanced chemical vapor deposited a-SiC:H thin films

D.B. Hondongwa, L.R. Olasov, B.C. Daly, S.W. King, J. Bielefeld

Thin Solid Films· Volume 519· Issue 22
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Abstract

Abstract We report ultrafast optical measurements of the thermal conductivity and longitudinal sound velocity for a-SiC:H thin films deposited by plasma enhanced chemical vapor deposition (PECVD). Porous and non-porous films with mass densities ranging from 1.0–2.5 g/cm3 were obtained by intentionally varying the PECVD process conditions. The longitudinal sound velocities for these materials as determined by picosecond ultrasonics ranged from 2370 m/s to 10460 m/s, and the Young's modulus determined from the sound velocity measurements ranged from 5–200 GPa. Time domain thermoreflectance measurements determined the thermal conductivity to range from 0.0009 W/cmK to 0.042 W/cmK.
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Research context

OpenAlex topics: Thermal properties of materials · Thin-Film Transistor Technologies · Semiconductor materials and devices

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