Cross-sectional X-ray nanobeam diffraction analysis of a compositionally graded CrNx thin film

Abstract Synchrotron X-ray nanodiffraction is used for the position-resolved characterization of a nanocrystalline graded CrN x thin film deposited with continuously increasing nitrogen content over the 6 μm film thickness. The diffraction experiment is performed in wide angle X-ray scattering transmission geometry using a monochromatic beam of 100 nm in diameter. The results reveal a complex microstructure and texture evolution in hexagonal Cr 2 N and cubic CrN x phases as well as a compressive strain increase in CrN x towards the film surface.