Pulsed laser deposition of (MoO3)1−x(V2O5)x thin films: Preparation, characterization and gasochromic studies

Abstract In this study we demonstrate a new composite oxide thin films of (MoO 3 ) 1 − x (V 2 O 5 ) x , x = 0, 0.01, 0.03, and 0.05, fabricated by pulsed laser deposition (PLD). The performance of platinum (Pt) catalyst activated hydrogen gas sensor with modified (MoO 3 ) 1 − x (V 2 O 5 ) x thin films were investigated. The thickness of the (MoO 3 ) 1 − x (V 2 O 5 ) x thin film is about 600–650 nm and its surface has a uniform morphology. Our results show that the gasochromic sensors prepared by (MoO 3 ) 0.99 (V 2 O 5 ) 0.01 thin film exhibited excellent hydrogen sensibility. The response and recovery time are in the range of 9–15 min for coloration and bleaching at room temperature under H 2 atmosphere. The results also show that (MoO 3 ) 1 − x (V 2 O 5 ) x /Pt (x = 0.01, 0.03, 0.05) thin films perform better gasochromic capability than the pristine MoO 3 /Pt sample.