Thermal properties of TiO2 films grown by atomic layer deposition
Source abstract
Abstract
Abstract We study the thermal properties of amorphous TiO2 thin films of various thicknesses t, grown by atomic layer deposition. The thermo-optic coefficient dn/dT and the temperature coefficient dρ/dT of film density ρ are determined from ellipsometric data in wavelength range 380
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Research context
OpenAlex topics: Semiconductor materials and devices · Optical Coatings and Gratings · Transition Metal Oxide Nanomaterials
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