Preparation and characterization of increased-efficiency photocatalytic TiO2–2N thin films

Abstract We report here on the characteristics of RF-sputtered 300 nm thick films of TiO2–2xNx prepared on glass substrates at 350 °C, by adjusting the N2:Ar partial pressure ratio in the deposition chamber between 0.00 and 0.33. XRD, XPS, AFM and contact angle data were used to derive film structure, elemental composition and oxidation state of Ti, surface morphology and hydrophilicity, respectively. The band gap was derived from spectral data in the 350–450 nm range. Film structure and composition were changed by adjusting the partial pressure of the reactive gases during sputtering and by post-deposition annealing at 400 °C in air, for 90 min. The values of the contact angle of films' surface with de-ionized water and of surface free energy per unit area show that films are super-hydrophilic for high-nitrogen content. Correlations are made between film structure, elemental composition, electronic and wettability properties.