Incorporation of OH radicals in anodic silicon oxide films studied by secondary-ion mass spectroscopy, X-ray photoelectron spectroscopy and ir analysis
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OpenAlex topics: Semiconductor materials and devices · Anodic Oxide Films and Nanostructures · Electron and X-Ray Spectroscopy Techniques
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References (16)
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1. Hasegawa · J. Electrochem. Soc. · 1988 · 135 · 42410.1149/1.2095631 ↗
2. Revesz · J. Electrochem. Soc. · 1967 · 114 · 62910.1149/1.2426669 ↗
3. Duflek · J. Electrochem. Soc. · 1964 · 111 · 104210.1149/1.2426314 ↗
4. Schmidt · J. Electrochem. Soc. · 1957 · 104 · 23010.1149/1.2428542 ↗
5. Mende · Thin Solids Films · 1989 · 168 · 5110.1016/0040-6090(89)90688-3 ↗
6. Barber · J. Electrochem. Soc. · 1976 · 123 · 40410.1149/1.2133085 ↗
7. Albella · J. Electrochem. Soc. · 1984 · 131 · 110110.1149/1.2115758 ↗
8. Madon · J. Electrochem. Soc. · 1988 · 135 · 22910.1149/1.2095561 ↗
9. Ocaña · J. Non- Cryst. Solids · 1989 · 107 · 18710.1016/0022-3093(89)90461-4 ↗
10. Pliskin · J. Electrochem. Soc. · 1965 · 112 · 101310.1149/1.2423333 ↗
11. Beckmann · J. Electrochem. Soc. · 1971 · 118 · 61410.1149/1.2408122 ↗
12. 1985
13. Bell · Phys. Rev. B · 1988 · 37 · 838310.1103/PhysRevB.37.8383 ↗
14. Karcher · Phys. Rev. B · 1984 · 30 · 198610.1103/PhysRevB.30.1896 ↗
15. Chao · Appl. Phys. Lett. · 1984 · 44 · 1010.1063/1.94573 ↗
16. Elizalde · Vacuum · 1987 · 37 · 4