journal article·2010-07

Low temperature growth and properties of Cu–In–Te based thin films for narrow bandgap solar cells

Takahiro Mise, Tokio Nakada

Thin Solid Films· Volume 518· Issue 19
Publisher page

Abstract

Abstract Cu–In–Te based thin films were grown onto soda–lime glass (SLG) substrates at 200 °C by co-evaporation using a molecular beam epitaxy system. The microstructural properties were examined by means of scanning electron microscopy, X-ray diffraction and Raman scattering. The crystalline quality of Cu–In–Te based thin films with high Cu/In ratios is superior to that of films with low Cu/In ratios. The films with Cu/In ratios of 0.69 ± 0.04 exhibited a single chalcopyrite phase with random orientation, whereas a defect chalcopyrite phase with a preferred (112) orientation was obtained for thin films with Cu/In ratios of 0.26 ± 0.02. However, the films with high Cu/In ratios of 0.69 ± 0.04 showed nearly constant low resistivity (∼ 10− 2 Ω cm) at temperatures from 80 to 400 K due to high hole concentration (> 1019 cm− 3), resulting in semi-metallic behavior. The hole conduction mechanism of the film (Cu/In atomic ratios = 0.26 ± 0.02) with semi-conductive properties was found to be variable-range-hopping of the Mott type in the wide range of 80–300 K. The optical bandgaps of Cu–In–Te based thin films are determined to be 0.93–1.02 eV at 300 K from transmission and reflection measurements. A solar cell with a ZnO/CdS/CuIn3Te5/Mo/SLG structure showed a total area (0.50 cm2) efficiency of 5.1% under AM1.5 illumination (100 mW/cm2) after light soaking. The conduction band offset at the CdS/CuIn3Te5 interface was estimated to be − 0.14 eV from X-ray photoelectron spectroscopy analysis.
Source: openaire · Quality: candidate unverified · Source record ↗

Research context

OpenAlex topics: Chalcogenide Semiconductor Thin Films · Quantum Dots Synthesis And Properties · Copper-based nanomaterials and applications

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (23)

Show source-provided references
1. Wagner · Appl. Phys. Lett. · 1974 · 25 · 43410.1063/1.1655537 ↗
2. Shay · Appl. Phys. Lett. · 1975 · 27 · 8910.1063/1.88372 ↗
3. Phil · Appl. Phys. Lett. · 1975 · 26 · 71710.1063/1.88048 ↗
4. Repins · Prog. Photovolt. Res. Appl. · 2008 · 16 · 23510.1002/pip.822 ↗
5. Abo El Soud · J. Mater. Sci. · 1993 · 28 · 118210.1007/BF01191950 ↗
6. Roy · Vacuum · 2002 · 65 · 2710.1016/S0042-207X(01)00391-8 ↗
7. Kazmerski · Thin Solid Films · 1977 · 41 · 3510.1016/0040-6090(77)90007-4 ↗
8. Neumann · Kristall und Tech. · 1980 · 15 · 6110.1002/crat.19800150110 ↗
9. Boehnke · J. Mater. Sci. · 1987 · 22 · 163510.1007/BF01132385 ↗
10. Nadenau · J. Cryst. Growth · 1995 · 146 · 25110.1016/0022-0248(94)00514-1 ↗
11. Palatnik · Soviet Phys. Doklady · 1966 · 12 · 503
12. Diaz · Appl. Phys. A · 2005 · 81 · 43310.1007/s00339-005-3245-x ↗
13. Mise · 2009 · 3062
14. Kaminow · Phys. Rev. B · 1970 · 2 · 96010.1103/PhysRevB.2.960 ↗
15. Neumann · Sol. Cells · 1986 · 16 · 39910.1016/0379-6787(86)90100-6 ↗
16. Rincon · J. Appl. Phys. · 2000 · 88 · 343910.1063/1.1289225 ↗
17. Marin · J. Appl. Phys. · 2000 · 87 · 781410.1063/1.373460 ↗
18. Efros · J. Phys. C · 1975 · 8 · L4910.1088/0022-3719/8/4/003 ↗
19. Mott · J. Non-Cryst. Solids · 1972 · 8–10 · 110.1016/0022-3093(72)90112-3 ↗
20. Blakemore · 1962 · 117
21. Dirnstorfer · Phys. Stat. Sol. (a) · 1998 · 168 · 16310.1002/(SICI)1521-396X(199807)168:1<163::AID-PSSA163>3.0.CO;2-T ↗
22. Wasim · J. Phys. Chem. Solids · 2003 · 64 · 162710.1016/S0022-3697(03)00099-4 ↗
23. Zhang · J. Appl. Phys. · 1998 · 83 · 319210.1063/1.367120 ↗