journal article·1998-11

XPS and AFM study of chemical mechanical polishing of silicon nitride

G.-R Yang, Y.-P Zhao, Y.Z Hu, T Paul Chow, Ronald J Gutmann

Thin Solid Films· Volume 333· Issue 1-2
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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Advanced Surface Polishing Techniques · Diamond and Carbon-based Materials Research · Metal and Thin Film Mechanics

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References (11)

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