Synthesis, structural and mechanical characterization of sputtered tungsten oxide coatings

Tungsten oxide coatings were deposited without substrate bias by DC reactive magnetron sputtering of a tungsten target using oxygen as reactive gas. By tuning the partial pressure of oxygen (pO2/pAr) between 0 and 4, the oxygen content of the films was changed from 0 to 75 at.%. The structure of the films (investigated by X-ray diffraction) depends on their oxygen content. For low oxygen contents, the α-W and β-W3O phases were observed (< 30 at.%), and with the increase of oxygen content (30 at.% < O < 67 at.%) the structure became amorphous. A transition region was obtained for oxygen content between 67 at.% and 75 at.%, and when O > 75 at.%, a nanocrystalline (WO3) structure was reached. The hardness and Young`s modulus were evaluated by depth sensing indentation. The decrease in hardness followed the four different ranges of chemical compositions accordingly, from ≈ 23 GPa for pure W down to ≈ 7 GPa for WO3 films. A similar behaviour was observed for the Young`s modulus, which ranged from 450 GPa to 150 GPa. The cohesion/adhesion of the films were investigated using a scratch-test apparatus. These coatings displayed a low adhesion (critical load, Lc < 15 N) to the steel substrate because the depositions were carried out intentionally without an adhesion interfacial layer.