Room temperature deposition of ITO using r.f. magnetron sputtering

Using r.f. magnetron sputtering, indium tin oxide (ITO) films were deposited at room temperature on glass substrates. The effects of sputtering power and oxygen flow rate were examined and related to the physical properties of the films such as sheet resistance, optical transparency stress, crystallinity, and porosity. We demonstrate the deposition of ITO films at room temperature with a transparency between 70 and 90% in the visible spectrum and an 18 Ω/□ sheet resistance.