α-Cr2O3 template-texture effect on α-Al2O3 thin-film growth
Source abstract
Abstract
Abstract We employ textured α-Cr 2 O 3 thin films as templates for growth of α-Al 2 O 3 by reactive inductively coupled plasma magnetron sputtering. The texture of the template has a strong influence on the nucleation and growth of α-Al 2 O 3 . Extended growth of α-Al 2 O 3 at a substrate temperature of 450 °C is obtained using a predominantly [1014]-textured α-Cr 2 O 3 template layer, while only limited α-Al 2 O 3 nucleation is seen on a [0001]-textured α-Cr 2 O 3 template.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Metal and Thin Film Mechanics · Copper Interconnects and Reliability · Semiconductor materials and devices
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