Preparation, structure and properties of MoSx films

G. Weise; N. Mattern; H. Hermann; A. Teresiak; I. Bächer; W. Brückner; H.-D. Bauer; H. Vinzelberg; G. Reiss; U. Kreissig; M. Mäder; P. Markschläger

doi:10.1016/s0040-6090(96)09165-1

journal article·1997-04

Preparation, structure and properties of MoSx films

G. Weise, N. Mattern, H. Hermann, A. Teresiak, I. Bächer, W. Brückner, H.-D. Bauer, H. Vinzelberg, G. Reiss, U. Kreissig, M. Mäder, P. Markschläger

Thin Solid Films· Volume 298· Issue 1-2

Publisher page

Bibliographic record

Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

Source: Not provided · Quality: missing

Research context

OpenAlex topics: Metal and Thin Film Mechanics · High-Temperature Coating Behaviors · Semiconductor materials and interfaces

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (20)

Show source-provided references

1. T. Spalvins. J. Vac. Sci. Technol. A, 5 (1987) 212.10.1116/1.574106 ↗

2. E.W. Roberts, Tribol. Int., 23 (1990) 45.10.1016/0301-679X(90)90042-N ↗

3. M.R. Hilton and P.D. Fleischauer, Surf. Coat. Technol., 54–55 (1992) 435.10.1016/S0257-8972(07)80062-4 ↗

4. I.L. Singer, in Fundamental in Friction: Macroscopic and Microscopic Processes, Kluwer, Dordrecht, 1992, p. 237.10.1007/978-94-011-2811-7_13 ↗

5. J. Rechberger and R. Dubach, Surf. Coat. Technol., 60 (1993) 584.10.1016/0257-8972(93)90157-J ↗

6. D. Kraut, G. Weise, W. Olbrich and G. Kampschulte, Surf. Coat. Technol., 60 (1993) 515.10.1016/0257-8972(93)90144-D ↗

7. G. Weise, D. Kraut, W. Olbrich and G. Kampschulte, Surf. Coat. Technol., 68–69 (1994) 512.10.1016/0257-8972(94)90210-0 ↗

8. G. Weise, A. Teresiak, I. Bächer, P. Markschläger and G. Kampschulte, Surf. Coat. Technol., 76–77 (1995) 382.10.1016/0257-8972(95)02605-3 ↗

9. S.E. Doyle, N. Mattern, W. Pitschke, G. Weise, D. Kraut and H.D. Bauer, Thin Solid Films, 245 (1994) 255.10.1016/0040-6090(94)90907-5 ↗

10. G. Sobe, H. Schreiber, G. Weise and A. Heinrich, Contrib. Plasma Phys., 33 (1993) 325.10.1002/ctpp.2150330411 ↗

11. P.A. Bertrand, J. Mater. Res., 4 (1989) 180.10.1557/JMR.1989.0180 ↗

12. J.R. Lince, J. Mater. Res., 5 (1990) 218.10.1557/JMR.1990.0218 ↗

13. J. Moser, H. Liao and F. Levy, J. Phys. D: Appl. Phys., 23 (1990) 624.10.1088/0022-3727/23/5/026 ↗

14. J. Moser and F. Levy, Thin Solid Films, 240 (1994) 56.10.1016/0040-6090(94)90693-9 ↗

15. V. Buck, Vakuumtechnik, 37 (1988) 111.

16. V. Buck, Thin Solid Films, 198 (1991) 157.10.1016/0040-6090(91)90334-T ↗

17. H.P. Klug and L.E. Alexander, X-Ray Diffraction Procedures, Wiley, New York, 1954.

18. W.W. Beeman, P. Kaesberg, J.W. Anderegg and M.B. Webb, in S. Flügge (Ed.), Encyclopedia of Physics, Vol. XXXII, Springer, Berlin, 1957, p. 408.

19. R. Hosemann and S.N. Bagchi, Direct Analysis of Diffraction by Matter, North-Holland, Amsterdam, 1962, p. 428; J. Mehring, Acta Cryst., 2 (1949) 371.

20. H. Shi, J.N. Reimers and J.R. Dahn, J. Appl. Cryst., 26 (1993) 827.10.1107/S0021889893003784 ↗