Chemical bath deposition of MoS2 thin film using ammonium tetrathiomolybdate as a single source for molybdenum and sulphur
Source abstract
Abstract
Molybdenum disulphide, MoS2, thin films have been deposited by chemical bath deposition method on glass and quartz substrate using ammonium tetrathiomolybdate as a single source precursor for Mo and S and subjected to vacuum heat treatment at different temperatures. X-ray diffraction of as-deposited film indicated its amorphous character and showed the development of poorly crystalline MoS2 thin film on increasing annealing temperature. The film has been characterized by energy dispersive X-ray analysis, X-ray photoelectron spectroscopy, scanning electron micrograph and the optical properties also have been studied.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Chalcogenide Semiconductor Thin Films · Metal and Thin Film Mechanics · Electrodeposition and Electroless Coatings
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