article·2004-12-06

Photochemical deposition of CuxS thin films from aqueous solutions

Jiban Podder, Ryohei Kobayashi, M. Ichimura

Publisher page

Abstract

Abstract Cu x S thin films were deposited on indium–tin–oxide-coated glass substrates by photochemical deposition from an aqueous solution of CuSO 4 and Na 2 S 2 O 3 . Thin films of different compositions of Cu x S were deposited in acidic medium (pH ∼3.0) for the duration of 1–2 h photoirradiation. The thickness of the films was measured in the range of 0.15–0.35 μm. The as-deposited films were characterized by Auger electron spectroscopy (AES), X-ray diffraction (XRD), Raman spectroscopy and optical transmission spectroscopy. AES analysis showed a continuous copper–sulfur ratio x from 2.3 to 1.3 depending on the solution composition. Raman peaks were measured at about 475 cm −1 . XRD studies showed polycrystallinity of the Cu x S thin films. The optical spectra of Cu x S films exhibit high transmission in the visible region and absorption throughout the near-infrared region (800–1500 nm). The energy band gap of Cu x S films was estimated in the range of 2.15–2.53 eV.
Source: openaire · Quality: candidate unverified · Source record ↗

Research context

OpenAlex topics: Chalcogenide Semiconductor Thin Films · Quantum Dots Synthesis And Properties · Copper-based nanomaterials and applications

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References

Reference metadata was not supplied for this record.