article·2002-05-01

Properties of copper–aluminum oxide films prepared by solution methods

Kazuhiko Tonooka, Katsuyoshi Shimokawa, Okio Nishimura

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Abstract

Abstract Conducting copper–aluminum oxide films have been prepared by employing the dip-coating method. Metal alkoxides and nitrates were examined as metal sources in the precursor solutions for the preparation of CuAlO 2 samples based on the procedures of sol–gel and nitrate processes, respectively. Fired samples were investigated by X-ray diffraction (XRD), thermogravimetric analysis and electrical measurements. Properties of the samples depended on the calcination temperature and the composition of the precursor solution. Electrical conductance of the samples corresponds well with the delafossite CuAlO 2 content, which was determined by the intensity of corresponding lines in the XRD patterns. The lowest sheet resistance (≈45 Ω/□) was obtained for a film sample prepared by the nitrate process followed by a calcination at 1100 °C for 4 h in air.
Source: openaire · Quality: candidate unverified · Source record ↗

Research context

OpenAlex topics: Copper-based nanomaterials and applications · ZnO doping and properties · Electronic and Structural Properties of Oxides

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