Atomic layer deposition of iron(III) oxide on zirconia nanoparticles in a fluidized bed reactor using ferrocene and oxygen
Source abstract
Abstract
Abstract Conformal films of amorphous iron(III) oxide and α-Fe 2 O 3 have been coated on zirconia nanoparticles (26 nm) in a fluidized bed reactor by atomic layer deposition. Ferrocene and oxygen were alternately dosed into the reactor at temperatures between 367 °C and 534 °C. Self-limiting chemistry was observed via in situ mass spectrometry, and by means of induced coupled plasma-atomic emission spectroscopy analysis. Film conformality and uniformity were verified by high resolution transmission electron microscopy, and the growth rate was determined to be 0.15 A per cycle. Energy dispersive spectroscopy, X-ray diffractometry, and X-ray photoelectron spectroscopy were utilized as a means to determine film composition at each deposition temperature. Over all of the deposition temperatures investigated, films were deposited as amorphous iron(III) oxide. However, after heat treatment at 850 °C in air and N 2 atmospheres, α-Fe 2 O 3 was the predominant species.
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Research context
OpenAlex topics: Semiconductor materials and devices · Electronic and Structural Properties of Oxides · Copper Interconnects and Reliability
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