article·2000-01-01Open access

Comparative study of CdS thin films deposited by single, continuous, and multiple dip chemical processes

Isaiah O. Oladeji, Lee Chow, J.R Liu, W. K. Chu, A.N.P. Bustamante, C. J. Fredricksen, Alfons Schulte

Abstract

We have used Rutherford backscattering spectrometry (RBS), X-ray diffraction (XRD), Raman, and photoconductivity to characterize CdS thin films grown by single, continuous, and multiple dip chemical processes. XRD has further shown, without ambiguity, that grown CdS films, independent of the process, in an almost homogeneous reaction free basic aqueous bath have a zincblende crystal structure where reflections from (111), (200), (220), and (311) planes are clearly identified. RBS, Raman, and photoconductivity confirm the high stoichiometry and excellent structural properties with low optically active trap state density of single and continuous dip CdS films. However, they collectively suggest that multiple dip CdS films suffer from defects that act as carrier traps and lead to prolong photoconductivity decay in these films.
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Research context

OpenAlex topics: Chalcogenide Semiconductor Thin Films · Quantum Dots Synthesis And Properties · Copper-based nanomaterials and applications

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