article·1994-10-01

Development of crystallinity and morphology in hafnium dioxide thin films grown by atomic layer epitaxy

Mikko Ritala, Markku Leskelä, Lauri Niinistö, Thomas Prohaska, Gernot Friedbacher, M. Grasserbauer

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OpenAlex topics: Semiconductor materials and devices · Integrated Circuits and Semiconductor Failure Analysis · Advanced Surface Polishing Techniques

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