article·2024-04-27

Formation of SiO2 thin films through plasma- enhanced chemical vapor deposition using SiH4/Ar/N2O

Jingjing Zhang, Jingquan Guo, Qiutong Zhao, Lihui Yu, Shujun Ye, Hongxing Yin, Yeliang Wang

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OpenAlex topics: Semiconductor materials and devices · Thin-Film Transistor Technologies · ZnO doping and properties

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