article·1999-03-01

A study of GaN etch mechanisms using inductively coupled Cl2/Ar plasmas

Hyeon Soo Kim, G.Y. Yeom, Jae‐Won Lee, Tae‐Il Kim

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Abstract

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Research context

OpenAlex topics: GaN-based semiconductor devices and materials · Plasma Diagnostics and Applications · Photocathodes and Microchannel Plates

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