Evolution of structure and properties of multi-component (AlCrTaTiZr)Ox films

Abstract (AlCrTaTiZr)O x films were deposited at 350 °C by DC magnetron sputtering from high-entropy alloy target. Oxygen concentration increases with oxygen flow ratio, and saturates near 67 at.%. As-deposited films have an amorphous structure. Their hardness fall in the range of 8–13 GPa. All amorphous oxide films maintain their amorphous structure up to 800 °C for at least 1 h. After 900 °C 5 h annealing, crystalline phases with the structures of ZrO 2 , TiO 2 , or Ti 2 ZrO 6 form. Annealing enhances mechanical properties of the films. Their hardness and modulus attain to the values about 20 and 260 GPa, respectively. The resistivity of the metallic films is around 10 2 μΩ cm but drastically rises to 10 12 μΩ cm when oxygen concentration increases.