journal article·2024-06-11

Wafer-Scale Synthesis of Highly Oriented 2D Topological Semimetal PtTe2 via Tellurization

Minhyuk Choi, Saeyoung Oh, Sungsoo Hahn, Yubin Ji, Min-kyung Jo, Jeongtae Kim, Tae-Seong Ju, Gyeongbo Kim, Minseung Gyeon, Yuhwa Lee, Jeonghyeon Do, Seungwook Choi, Ansoon Kim, Seungmo Yang, Chanyong Hwang, Kab-Jin Kim, Doohee Cho, Changyoung Kim, Kibum Kang, Hu Young Jeong, Seungwoo Song

ACS Nano· Volume 18· Issue 23
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Abstract

Platinum ditelluride (1 T -PtTe 2 ) is a two-dimensional (2D) topological semimetal with a distinctive band structure and flexibility of van der Waals integration as a promising candidate for future electronics and spintronics. Although the synthesis of large-scale, uniform, and highly crystalline films of 2D semimetals system is a prerequisite for device application, the synthetic methods meeting these criteria are still lacking. Here, we introduce an approach to synthesize highly oriented 2D topological semimetal PtTe 2 using a thermally assisted conversion called tellurization, which is a cost-efficient method compared to the other epitaxial deposition methods. We demonstrate that achieving highly crystalline 1 T -PtTe 2 using tellurization is not dependent on epitaxy but rather relies on two critical factors: (i) the crystallinity of the predeposited platinum (Pt) film and (ii) the surface coverage ratio of the Pt film considering lateral lattice expansion during transformation. By optimizing the surface coverage ratio of the epitaxial Pt film, we successfully obtained 2 in. wafer-scale uniformity without in-plane misalignment between antiparallelly oriented domains. The electronic band structure of 2D topological PtTe 2 is clearly resolved in momentum space, and we observed an interesting 6-fold gapped Dirac cone at the Fermi surface. Furthermore, ultrahigh electrical conductivity down to ∼3.8 nm, which is consistent with that of single crystal PtTe 2, was observed, proving its ultralow defect density.
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Research context

OpenAlex topics: Graphene research and applications · Topological Materials and Phenomena · 2D Materials and Applications

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Strategic Technology Research Institute, Korea Research Institute of Standards and Science (KRISS), Daejeon 34113, Republic of Korea

Department of Physics and Research Institute for Convergence of Basic Sciences, Hanyang University (HYU), Seoul 04763, Republic of Korea

Graduate School of Semiconductor Materials and Devices Engineering, Ulsan National Institute of Science and Technology (UNIST), Ulsan 44919, Republic of Korea

Quantum Technology Institute, Korea Research Institute of Standards and Science (KRISS), Daejeon 34113, Republic of Korea

Department of Physics, Korea Advanced Institute of Science and Technology (KAIST), Daejeon 34141, Republic of Korea

Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology(KAIST), Daejeon 34141, Republic of Korea

Graduate Program of Semiconductor Science and Engineering, Yonsei University (YU), Seoul 03722, Republic of Korea

Department of High Temperature Materials, Korea Institute of Materials Science (KIMS), Changwon 51508, Republic of Korea

Department of Physics, Yonsei University (YU), Seoul 03722, Republic of Korea

Department of Physics and Astronomy, Seoul National University (SNU), Seoul 08826, Republic of Korea

Funding

National Research Foundation of Korea

References (66)

Show source-provided references
1. 10.1021/acsnano.9b0799010.1021/acsnano.9b07990 ↗
2. 10.1038/s41586-019-1013-x10.1038/s41586-019-1013-x ↗
3. 10.1038/nature1576810.1038/nature15768 ↗
4. 10.1103/PhysRevLett.117.05680510.1103/PhysRevLett.117.056805 ↗
5. 10.1103/RevModPhys.81.10910.1103/RevModPhys.81.109 ↗
6. 10.1038/s41467-017-02237-110.1038/s41467-017-02237-1 ↗
7. 10.1038/nphys387110.1038/nphys3871 ↗
8. 10.1103/PhysRevB.96.12510210.1103/PhysRevB.96.125102 ↗
9. 10.1038/s41467-017-00280-610.1038/s41467-017-00280-6 ↗
10. 10.1038/s41563-018-0132-310.1038/s41563-018-0132-3 ↗
11. 10.1103/PhysRevLett.123.11640110.1103/PhysRevLett.123.116401 ↗
12. 10.1103/PhysRevB.94.08512710.1103/PhysRevB.94.085127 ↗
13. 10.1103/PhysRevB.97.24110210.1103/PhysRevB.97.241102 ↗
14. 10.1103/PhysRevB.96.04120110.1103/PhysRevB.96.041201 ↗
15. 10.1021/acs.chemmater.8b0213210.1021/acs.chemmater.8b02132 ↗
16. 10.1002/adfm.20170597010.1002/adfm.201705970 ↗
17. 10.1002/adma.20170715210.1002/adma.201707152 ↗
18. 10.1021/acsphotonics.8b0085310.1021/acsphotonics.8b00853 ↗
19. 10.1002/adma.20200441210.1002/adma.202004412 ↗
20. 10.1021/acsami.0c1499610.1021/acsami.0c14996 ↗
21. 10.1002/adma.20200051310.1002/adma.202000513 ↗
22. 10.1002/aelm.20220064710.1002/aelm.202200647 ↗
23. 10.1103/PhysRevB.105.10450110.1103/PhysRevB.105.104501 ↗
24. 10.1038/s41524-022-00871-y10.1038/s41524-022-00871-y ↗
25. 10.1038/s43246-020-00060-810.1038/s43246-020-00060-8 ↗
26. 10.1021/acs.nanolett.8b0058310.1021/acs.nanolett.8b00583 ↗
27. 10.1039/D1TC05872J10.1039/D1TC05872J ↗
28. 10.1016/j.mtla.2022.10151110.1016/j.mtla.2022.101511 ↗
29. 10.1038/s41928-020-0396-x10.1038/s41928-020-0396-x ↗
30. 10.1038/s41467-022-32582-910.1038/s41467-022-32582-9 ↗
31. 10.1063/1.165268010.1063/1.1652680 ↗
32. 10.1103/PhysRevB.1.138210.1103/PhysRevB.1.1382 ↗
33. 10.1038/s41565-021-00963-810.1038/s41565-021-00963-8 ↗
34. 10.1038/s41565-021-01004-010.1038/s41565-021-01004-0 ↗
35. 10.1038/s41586-022-04523-510.1038/s41586-022-04523-5 ↗
36. 10.1126/science.abf582510.1126/science.abf5825 ↗
37. 10.1038/s41565-023-01445-910.1038/s41565-023-01445-9 ↗
38. 10.1039/D0RA04346J10.1039/D0RA04346J ↗
39. 10.1021/acs.nanolett.5b0096410.1021/acs.nanolett.5b00964 ↗
40. 10.1088/2053-1583/aa891910.1088/2053-1583/aa8919 ↗
41. 10.1038/ncomms1421610.1038/ncomms14216 ↗
42. 10.1088/2053-1583/ac166b10.1088/2053-1583/ac166b ↗
43. 10.1021/acs.chemmater.1c0216310.1021/acs.chemmater.1c02163 ↗
44. 10.1021/acsnano.2c0430310.1021/acsnano.2c04303 ↗
45. 10.1021/acsnano.8b0947910.1021/acsnano.8b09479 ↗
46. 10.1021/acsnano.8b0454010.1021/acsnano.8b04540 ↗
47. 10.1038/s41586-023-06404-x10.1038/s41586-023-06404-x ↗
48. 10.1021/acsnano.5b0128110.1021/acsnano.5b01281 ↗
49. 10.1016/j.susc.2011.07.00210.1016/j.susc.2011.07.002 ↗
50. 10.1016/S0039-6028(98)00363-X10.1016/S0039-6028(98)00363-X ↗
51. 10.1007/BF0302594110.1007/BF03025941 ↗
52. 10.1103/PhysRevApplied.14.05405610.1103/PhysRevApplied.14.054056 ↗
53. 10.1016/j.jcrysgro.2016.12.10210.1016/j.jcrysgro.2016.12.102 ↗
54. 10.1038/s41467-020-19752-310.1038/s41467-020-19752-3 ↗
55. Eyring, H.; Lin, S. H.; Lin, S. M. Basic Chemical Kinetics Ch. Wiley: Hoboken, NJ, USA; p 1980.
56. 10.1021/acsami.9b2183810.1021/acsami.9b21838 ↗
57. 10.1063/1.479351810.1063/1.4793518 ↗
58. 10.1021/acs.nanolett.7b0273710.1021/acs.nanolett.7b02737 ↗
59. 10.1002/smll.20200443710.1002/smll.202004437 ↗
60. 10.1038/s44160-022-00134-010.1038/s44160-022-00134-0 ↗
61. 10.1021/acs.chemmater.8b0406910.1021/acs.chemmater.8b04069 ↗
62. 10.1038/ncomms1421610.1038/ncomms14216 ↗
63. 10.1016/j.scib.2019.05.02310.1016/j.scib.2019.05.023 ↗
64. 10.1002/advs.20210350710.1002/advs.202103507 ↗
65. 10.1016/j.isci.2022.10534610.1016/j.isci.2022.105346 ↗
66. 10.1103/PhysRevLett.115.07680210.1103/PhysRevLett.115.076802 ↗