journal article·2010-12

Carboxymethyl chitosan coating to block photocatalytic activity of TiO2 nanoparticles

Xianqiong Chen, Yuyang Liu, Haifeng Shi, Xiaowen Wang, Kaihong Qi, Xiang Zhou, John H Xin

Textile Research Journal· Volume 80· Issue 20
Publisher page

Abstract

In order to lower photocatalytic degradation of TiO 2 on skin and textiles, carboxymethyl chitosan (CMCH) was used to coat TiO 2 nanoparticles. The polymer (CMCH) not only acted as the blocking agent of photocatalytic activity, but also dispersed TiO 2 nanoparticles better to prohibit them from congregation by anchoring them. The structure of as-prepared nanocomposites was characterized by scanning electron microscopy (SEM) and high-resolution transmission electron microscopy (HRTEM). The TiO 2 /CMCH nanocomposites were coated onto cotton fabrics by a dip-pad—drycure process. The treated cotton fabrics demonstrated lower photocatalytic activity in comparison to cotton fabrics treated by pure TiO 2 in a typical photocatalytic test. The treated cotton showed a combination of bactericidal activity of TiO 2 and CMCH, and excellent protection against UV radiation.
Source: crossref · Quality: baseline

Research context

OpenAlex topics: Skin Protection and Aging · Dyeing and Modifying Textile Fibers · Nanoparticles: synthesis and applications

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Institute of Textiles & Clothing, The Hong Kong Polytechnic University, Hung Hom, Hong Kong, College of Chemistry, Chemical Engineering and Biotechnology, Donghua University, Shanghai, China

Institute of Textiles & Clothing, The Hong Kong Polytechnic University, Hung Hom, Hong Kong, Department of Bioproducts and Biosystems Engineering, University of Minnesota, St Paul, USA

Institute of Functional Fiber, Tianjin Polytechnic University, Tianjin, China

Institute of Textiles & Clothing, The Hong Kong Polytechnic University, Hung Hom, Hong Kong

College of Chemistry, Chemical Engineering and Biotechnology, Donghua University, Shanghai, China

Institute of Textiles & Clothing, The Hong Kong Polytechnic University, Hung Hom, Hong Kong,

References (36)

Show source-provided references
1. Katiyar SK · Curr. Drug Targets · 2003 · 3 · 234
2. 10.1039/B505311K10.1039/B505311K ↗
3. 10.1016/j.taap.2003.08.01910.1016/j.taap.2003.08.019 ↗
4. 10.1002/app.2032710.1002/app.20327 ↗
5. 10.1103/PhysRevB.51.1302310.1103/PhysRevB.51.13023 ↗
6. 10.1016/S0014-5793(97)01356-210.1016/S0014-5793(97)01356-2 ↗
7. 10.1177/004051750708191610.1177/0040517507081916 ↗
8. 10.1039/b709449c10.1039/b709449c ↗
9. 10.1021/ja963011u10.1021/ja963011u ↗
10. 10.1002/1097-4628(19991213)74:12<2911::AID-APP16>3.0.CO;2-210.1002/1097-4628(19991213)74:12<2911::AID-APP16>3.0.CO;2-2 ↗
11. 10.1016/0305-1978(91)90054-410.1016/0305-1978(91)90054-4 ↗
12. 10.1039/b613872a10.1039/b613872a ↗
13. 10.1038/738510.1038/7385 ↗
14. 10.1021/cm991045610.1021/cm9910456 ↗
15. 10.1016/S1389-1723(99)80201-110.1016/S1389-1723(99)80201-1 ↗
16. 10.1016/j.carbpol.2005.10.01010.1016/j.carbpol.2005.10.010 ↗
17. 10.1016/S0144-8617(01)00243-010.1016/S0144-8617(01)00243-0 ↗
18. 10.1002/1520-6017(200101)90:1<38::AID-JPS5>3.0.CO;2-310.1002/1520-6017(200101)90:1<38::AID-JPS5>3.0.CO;2-3 ↗
19. 10.1016/0144-8617(88)90032-X10.1016/0144-8617(88)90032-X ↗
20. 10.1016/j.jconrel.2004.02.00210.1016/j.jconrel.2004.02.002 ↗
21. 10.1002/app.229010.1002/app.2290 ↗
22. 10.1016/j.bmcl.2005.06.09510.1016/j.bmcl.2005.06.095 ↗
23. 10.1016/j.bmc.2004.11.00210.1016/j.bmc.2004.11.002 ↗
24. 10.1016/j.carbpol.2004.06.04210.1016/j.carbpol.2004.06.042 ↗
25. 10.1016/S0960-894X(01)00285-210.1016/S0960-894X(01)00285-2 ↗
26. 10.1016/S0927-7765(03)00151-610.1016/S0927-7765(03)00151-6 ↗
27. 10.1271/bbb.62.20610.1271/bbb.62.206 ↗
28. 10.1002/mabi.20039004110.1002/mabi.200390041 ↗
29. 10.1002/app.1042410.1002/app.10424 ↗
30. 10.1016/S0144-8617(01)00370-810.1016/S0144-8617(01)00370-8 ↗
31. 10.1016/j.biomaterials.2003.09.10010.1016/j.biomaterials.2003.09.100 ↗
32. 10.1016/j.carbpol.2008.06.00910.1016/j.carbpol.2008.06.009 ↗
33. Liu PS · Nanotechnology · 2009 · 20
34. 10.1039/b509781a10.1039/b509781a ↗
35. 10.1128/JCM.38.2.724-726.200010.1128/JCM.38.2.724-726.2000 ↗
36. 10.1088/0957-4484/17/8/02110.1088/0957-4484/17/8/021 ↗