Directed Self-Assembly of Asymmetric Block Copolymers in Thin Films Driven by Uniaxially Aligned Topographic Patterns
Source abstract
Abstract
We present a simple, versatile approach to generate highly ordered nanostructures of block copolymers (BCPs) using rubbed surfaces. A block of poly(tetrafluoroethylene) (PTFE) was dragged across a flat substrate surface above the melting point of PTFE transferring a highly aligned PTFE topographic pattern to the substrate. Si wafer, glass, and polyimide films were used as substrates. Thin films of cylinder-forming asymmetric polystyrene-block-poly(2-vinylpyridine) copolymers (S2VPs) were solvent annealed on the surfaces having the transferred surface pattern to induce their directed self-assembly. Cylinders of P2VP oriented normal to the surface are markedly aligned along the rubbing direction and used as templates to generate extremely uniform arrays of various metallic nanoparticles of gold, silver, and platinum over a large area.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Block Copolymer Self-Assembly · Advanced Polymer Synthesis and Characterization · Polymer Surface Interaction Studies
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Department of Polymer Science and Engineering, Dankook University, 152 Jukjeon-ro, Suji-gu, Yongin-si, Gyeonggi-do 16890, Republic of Korea
Department of Energy Engineering, School of Energy and Chemical Engineering, Ulsan National Institute of Science and Technology (UNIST), Ulsan 44919, Republic of Korea
Department of Polymer Science and Engineering, University of Massachusetts, Amherst, Massachusetts 01003, United States
Funding
National Research Foundation of Korea · Air Force Office of Scientific Research · Gyeonggi Regional Research Center
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