Patterned modification of polymer surfaces employing UV sensitive gases

Photochemical methods were developed to obtain polymer surfaces modified with specific functional groups. Various polymers (among them polystyrene, polyethylene and poly(tetrafluoroethylene)) were UV irradiated in the presence of reactant gases (BrCN, N 2 H 4 and SO 2 + O 2 ) to introduce nitrile, amino and sulfonic acid groups onto the surface. Derivatization reactions allowed the transformation of these groups to carboxylic acids, amides, thioureas and derivatives of sulfonic acids (sulfochlorides and sulfonamides). UV projection techniques allowed a patterned modification of the surface.The modified patterns are of interest for the binding of monomers / oligomers, dyes and metallizations.