journal article·2019-04-23

Closing the Surface Bandgap in Thin Bi2Se3/Graphene Heterostructures

Jimin Chae, Seoung-Hun Kang, Sang Han Park, Hanbum Park, Kwangsik Jeong, Tae Hyeon Kim, Seok-Bo Hong, Keun Su Kim, Young-Kyun Kwon, Jeong Won Kim, Mann-Ho Cho

ACS Nano· Volume 13· Issue 4
Publisher page

Abstract

Topological insulator (TI), a band insulator with topologically protected edge states, is one of the most interesting materials in the field of condensed matter. Bismuth selenide (Bi2Se3) is the most spotlighted three-dimensional TI material; it has a Dirac cone at each top and bottom surface and a relatively wide bandgap. For application, suppression of the bulk effect is crucial, but in ultrathin TI materials, with thicknesses less than 3 QL, the finite size effect works on the linear dispersion of the surface states, so that the surface band has a finite bandgap because of the hybridization between the top and bottom surface states and Rashba splitting, resulting from the structure inversion asymmetry. Here, we studied the gapless top surface Dirac state of strained 3 QL Bi2Se3/graphene heterostructures. A strain caused by the graphene layer reduces the bandgap of surface states, and the band bending resulting from the charge transfer at the Bi2Se3–graphene interface induces localization of surface states to each top and bottom layer to suppress the overlap of the two surface states. In addition, we verified the independent transport channel of the top surface Dirac state in Bi2Se3/graphene heterostructures by measuring the magneto-conductance. Our findings suggest that the strain and the proximity effect in TI/non-TI heterostructures may be feasible ways to engineer the topological surface states beyond the physical and topological thickness limit.
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: Topological Materials and Phenomena · 2D Materials and Applications · Graphene research and applications

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Department of Physics, Yonsei University, Seoul 03722, Korea

Korea Institute for Advanced Study, Hoegiro 85, Seoul 02455, Korea

Pohang Accelerator Laboratory, POSTECH, Pohang 790-784, Korea

Department of Physics and Research Institute for Basic Sciences, Kyung-Hee University, Seoul 02447, Korea

Division of Industrial Metrology, Korea Research Institute of Standards and Science, Daejeon 34113, Korea

Funding

Samsung · National Research Foundation of Korea

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