journal article·2020-11-24

Magnetic Direct-Write Skyrmion Nanolithography

A. V. Ognev, A. G. Kolesnikov, Yong Jin Kim, In Ho Cha, A. V. Sadovnikov, S. A. Nikitov, I. V. Soldatov, A. Talapatra, J. Mohanty, M. Mruczkiewicz, Y. Ge, N. Kerber, F. Dittrich, P. Virnau, M. Kläui, Young Keun Kim, A. S. Samardak

ACS Nano· Volume 14· Issue 11
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Abstract

Magnetic skyrmions are stable spin textures with quasi-particle behavior and attract significant interest in fundamental and applied physics. The metastability of magnetic skyrmions at zero magnetic field is particularly important to enable, for instance, a skyrmion racetrack memory. Here, the results of the nucleation of stable skyrmions and formation of ordered skyrmion lattices by magnetic force microscopy in (Pt/CoFeSiB/W)n multilayers, exploiting the additive effect of the interfacial Dzyaloshinskii–Moriya interaction, are presented. The appropriate conditions under which skyrmion lattices are confined with a dense two-dimensional liquid phase are identified. A crucial parameter to control the skyrmion lattice characteristics and the number of scans resulting in the complete formation of a skyrmion lattice is the distance between two adjacent scanning lines of a magnetic force microscopy probe. The creation of skyrmion patterns with complex geometry is demonstrated, and the physical mechanism of direct magnetic writing of skyrmions is comprehended by micromagnetic simulations. This study shows a potential of a direct-write (maskless) skyrmion (topological) nanolithography with sub-100 nm resolution, where each skyrmion acts as a pixel in the final topological image.
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: Magnetic properties of thin films · Metallic Glasses and Amorphous Alloys · Nanoporous metals and alloys

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

School of Natural Sciences, Far Eastern Federal University, Vladivostok 690950, Russia

Department of Materials Science and Engineering, Korea University, Seoul 02841, Republic of Korea

Laboratory “Metamaterials”, Saratov State University, Saratov 410012, Russia

Kotel’nikov Institute of Radioengineering and Electronics, Russian Academy of Sciences, Moscow 125009, Russia

Leibniz Institute for Solid State and Material Research (IFW-Dresden), Dresden 01069, Germany

Institute of Natural Sciences and Mathematic, Ural Federal University, Yekaterinburg 620075, Russia

Indian Institute of Technology, Hyderabad 502285, India

Institute of Electrical Engineering, SAS, Bratislava 841 04, Slovakia

Centre for Advanced Materials Application (CEMEA), Slovak Academy of Sciences, Bratislava 845 11, Slovakia

Institut für Physik, Johannes Gutenberg-Universität Mainz, Mainz 55128, Germany

National Research South Ural State University, Chelyabinsk 454080, Russia

Funding

Samsung · Deutscher Akademischer Austauschdienst · European Regional Development Fund · National Research Foundation of Korea · Deutsche Forschungsgemeinschaft · FP7 International Cooperation · Russian Foundation for Basic Research · Johannes Gutenberg-Universit?t Mainz · Ministry of Education and Science of the Russian Federation · Council for Grants of the President of the Russian Federation · Government of the Russian Federation

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