journal article·2020-02-25

Robust Hot Electron and Multiple Topological Insulator States in PtBi2

Xiao-Ang Nie, Shujing Li, Meng Yang, Zhen Zhu, Hao-Ke Xu, Xu Yang, Fawei Zheng, Dandan Guan, Shiyong Wang, Yao-Yi Li, Canhua Liu, Jian Li, Ping Zhang, Youguo Shi, Hao Zheng, Jinfeng Jia

ACS Nano· Volume 14· Issue 2
Publisher page

Abstract

A two-dimensional topological insulator features (only) one bulk gap with nontrivial topology, which protects one-dimensional boundary states at the Fermi level. We find a quantum phase of matter beyond this category: a multiple topological insulator. It possesses a ladder of topological gaps; each gap protects a robust edge state. We prove a monolayer of van der Waals material PtBi2 as a two-dimensional multiple topological insulator. By means of scanning tunneling spectroscopy, we directly visualize the one-dimensional hot electron (and hole) channels with nanometer size on the samples. Furthermore, we confirm the topological protection of these channels by directly demonstrating their robustness to variations of crystal orientation, edge geometry, and sample temperature. The discovered topological hot electron materials may be applied as efficient photocatalysts in the future.
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Research context

OpenAlex topics: Topological Materials and Phenomena · Graphene research and applications · 2D Materials and Applications

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

School of Physics and Astronomy, Key Laboratory of Artificial Structures and Quantum Control (Ministry of Education), Shenyang National Laboratory for Materials Science, Shanghai Jiao Tong University, Shanghai 200240, China

College of Mathematics and Physics, Beijing University of Chemical Technology, Beijing 100029, China

Institute of Applied Physics and Computational Mathemmatics, Beijing 100088, China

Beijing National Laboratory for Condensed Matter Physics and Institute of Physics, Chinese Academy of Sciences, Beijing 100190, China

Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China

Tsung-Dao Lee Institute, Shanghai Jiao Tong University, Shanghai 200240, China

School of Science, Westlake Univeristy, Hangzhou 310024, China

Funding

Ministry of Science and Technology of the People's Republic of China · National Natural Science Foundation of China · Shanghai talent program

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