DataVXACS NanoPaper
journal article·2019-05-28Open access

Fast Electrochemical Storage Process in Sputtered Nb2O5 Porous Thin Films

Cassandra Arico, Saliha Ouendi, Pierre-Louis Taberna, Pascal Roussel, Patrice Simon, Christophe Lethien

ACS Nano· Volume 13· Issue 5
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Source abstract

Abstract

The formation of a thin film electrode exhibiting high capacity and high rate capabilities is challenging in the field of miniaturized electrochemical energy storage. Here, we present an elegant strategy to tune the morphology and the properties of sputtered porous Nb2O5 thin films deposited on Si-based substrates via the magnetron sputtering deposition technique. Kinetic analysis of the redox reactions is studied to qualify the charge storage process, where we observe a non-diffusion-controlled mechanism within the porous niobium pentoxide thin film. To improve the surface capacity of the Nb2O5 porous electrode, the thickness is progressively increased up to 0.94 μm, providing a surface capacity close to 60 μAh·cm–2 at 1 mV·s–1. The fabrication of high energy density miniaturized power sources based on the optimized T-Nb2O5 films could be achieved for Internet of Things applications requiring high rate capability.
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Research context

Materials processing

OpenAlex topics: Advancements in Battery Materials · Supercapacitor Materials and Fabrication · Transition Metal Oxide Nanomaterials

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Institut d’Electronique, de Microélectronique et de Nanotechnologie, Université de Lille, CNRS, Centrale Lille, ISEN, Université de Valenciennes, UMR 8520-IEMN, F-59000 Lille, France

Centre Interuniversitaire de Recherche et d’Ingénierie des Matériaux (CIRIMAT), CNRS UMR 5085, Université Paul Sabatier, 118 Route de Narbonne, 31062 Toulouse, France

Réseau sur le Stockage Electrochimique de l’Energie (RS2E), CNRS FR 3459, 33 Rue Saint Leu, 80039 Amiens Cedex, France

Unité de Catalyse et de Chimie du Solide (UCCS), Université de Lille, CNRS, Centrale Lille, ENSCL, Université d’Artois, UMR 8181−UCCS, F-59000 Lille, France

Funding

Agence Nationale de la Recherche

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