Observation of Surface Dirac Cone in High-Quality Ultrathin Epitaxial Bi2Se3 Topological Insulator on AlN(0001) Dielectric
Source abstract
Abstract
Bi2Se3 topological insulators (TIs) are grown on AlN(0001)/Si(111) substrates by molecular beam epitaxy. In a one-step growth at optimum temperature of 300 °C, Bi2Se3 bonds strongly with AlN without forming interfacial reaction layers. This produces high epitaxial quality Bi2Se3 single crystals with a perfect registry with the substrate and abrupt interfaces, allowing thickness scaling down to three quintuple layers (QL) without jeopardizing film quality. It is found by angle-resolved photoelectron spectroscopy that, remarkably, Bi2Se3 films maintain the 3D TI properties at very low thickness of 3QL (∼2.88 nm), exhibiting top surface gapless metallic states in the form of a Dirac cone.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Topological Materials and Phenomena · Graphene research and applications · Quantum many-body systems
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
National Center for Scientific Research, DEMOKRITOS, 15310 Athens, Greece
Department of Physics, Aristotle University of Thessaloniki, GR-54124 Thessaloniki, Greece
Imec, Kapeldreef 75, Leuven, Belgium
References (32)
Show source-provided references
1. Hasan M. Z. · Rev. Mod. Phys. · 2010 · 82 · 304510.1103/RevModPhys.82.3045 ↗
2. Qi X.-L. · Rev. Mod. Phys. · 2011 · 83 · 105710.1103/RevModPhys.83.1057 ↗
3. Kong D. · ACS Nano · 2011 · 5 · 469810.1021/nn200556h ↗
4. Lang M. · ACS Nano · 2012 · 6 · 29510.1021/nn204239d ↗
5. Scanlon D. O. · Adv. Mater. · 2012 · 24 · 215410.1002/adma.201200187 ↗
6. Taskin A. A. · Adv. Mater. · 2012 · 24 · 558110.1002/adma.201201827 ↗
7. Wang G. · Adv. Mater. · 2011 · 23 · 292910.1002/adma.201100678 ↗
8. Linder J. · Phys. Rev. B · 2009 · 80 · 20540110.1103/PhysRevB.80.205401 ↗
9. Shan W.-Y. · New J. Phys. · 2010 · 12 · 04304810.1088/1367-2630/12/4/043048 ↗
10. Liu C.-X. · Phys. Rev. B · 2010 · 81 · 041307(R)10.1103/PhysRevB.81.041307 ↗
11. Lu H.-Z. · Phys. Rev. B · 2010 · 81 · 11540710.1103/PhysRevB.81.115407 ↗
12. Chu R.-L. · Phys. Rev. B · 2011 · 83 · 07511010.1103/PhysRevB.83.075110 ↗
13. Zhang Y. · Nat. Phys. · 2010 · 6 · 58410.1038/nphys1689 ↗
14. Sakamoto Y. · Phys. Rev. B · 2010 · 81 · 16543210.1103/PhysRevB.81.165432 ↗
15. Chang C.-Z. · SPIN · 2011 · 01 · 2110.1142/S2010324711000033 ↗
16. Yazyev O. V. · Phys. Rev. Lett. · 2010 · 105 · 26680610.1103/PhysRevLett.105.266806 ↗
17. Berntsen M. H. · Phys. Rev. B · 2013 · 88 · 19513210.1103/PhysRevB.88.195132 ↗
18. Liu W. · Phys. Rev. B · 2013 · 87 · 20531510.1103/PhysRevB.87.205315 ↗
19. Zhang G. · Appl. Phys. Lett. · 2009 · 95 · 05311410.1063/1.3200237 ↗
20. Richardella A. · Appl. Phys. Lett. · 2010 · 97 · 26210410.1063/1.3532845 ↗
21. Tarakina N. V. · Cryst. Growth Des. · 2012 · 12 · 191310.1021/cg201636g ↗
22. He L. · Nano Lett. · 2012 · 12 · 148610.1021/nl204234j ↗
23. Wang Z. Y. · Appl. Phys. Lett. · 2011 · 99 · 02311210.1063/1.3610971 ↗
24. Le P. H. · Thin Solid Films · 2013 · 534 · 65910.1016/j.tsf.2013.01.104 ↗
25. Schulz H. · Solid State Commun. · 1977 · 23 · 81510.1016/0038-1098(77)90959-0 ↗
26. Zhang H. · Nat. Phys. · 2009 · 5 · 43810.1038/nphys1270 ↗
27. Hÿtch M. J. · Nature · 2008 · 453 · 108610.1038/nature07049 ↗
28. Nascimento V. B. · Electron. Spectrosc. Relat. Phenom. · 1999 · 104 · 9910.1016/S0368-2048(99)00012-2 ↗
29. Bansal N. · Thin Solid Films · 2011 · 520 · 22410.1016/j.tsf.2011.07.033 ↗
30. Kong D. · Nano Lett. · 2010 · 10 · 224510.1021/nl101260j ↗
31. Bernandini F. · Phys. Rev. B · 1997 · 56 · R1002410.1103/PhysRevB.56.R10024 ↗
32. Kinh S. W. · J. Appl. Phys. · 1998 · 84 · 524810.1063/1.368814 ↗