journal article·2009-08-25

Roll in and Roll out: A Path to High-Throughput Nanoimprint Lithography

Colin Stuart, Yong Chen

ACS Nano· Volume 3· Issue 8
Publisher page

Abstract

Roller-type nanoimprint lithography is a technique that can potentially increase the throughput of the imprinting process to levels competitive for low-cost, large-area, nanoscale manufacturing. A paper in this issue by Ahn and Guo presents a large-area roll-to-roll and roll-to-plate imprint process that builds on earlier work, increasing the substrate width to 4 in. and transferring patterns of 300 nm width and 600 nm pitch at a rate of 1 m/min.
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: Nanofabrication and Lithography Techniques · Advancements in Photolithography Techniques · Force Microscopy Techniques and Applications

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Mechanical & Aerospace Engineering Department, University of California, Los Angeles, California 90095

References (11)

Show source-provided references
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