journal article·2010-02-23

Soft-Etch Mesoporous Hole-Conducting Block Copolymer Templates

Edward J. W. Crossland, Pedro Cunha, Steve Scroggins, Stephen Moratti, Olena Yurchenko, Ullrich Steiner, Marc A. Hillmyer, Sabine Ludwigs

ACS Nano· Volume 4· Issue 2
Publisher page

Abstract

We present a mesoporous hole-conducting polymer film resulting from spontaneous block copolymer self-assembly based on a simple spin-coating protocol. A diblock copolymer consisting of a triphenylamine side group polymer and a poly(d,l-lactide) block (PSTPA-b-PLA) is shown to microphase separate to form ordered 13 nm cylindrical PLA microdomains embedded in the semiconducting PSTPA matrix. Partially ordered and film-spanning PLA domains could be identified in films immediately after spin coating from toluene solutions on conducting substrates. Selective mild etching of the minority PLA domains (in weak aqueous base) leads to a mesoporous hole-conducting polymer matrix. The pore structure is replicated electrochemically in platinum, demonstrating the viability of this approach to producing nano-organized heterojunction structures in thin films.
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Research context

OpenAlex topics: Block Copolymer Self-Assembly · Organic Electronics and Photovoltaics · Conducting polymers and applications

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Cavendish Laboratory, J. J. Thomson Avenue, University of Cambridge, Cambridge CB3 0HE, U.K.

Freiburg Institute for Advanced Studies (FRIAS), University of Freiburg, 79104 Freiburg, Germany

Division of Materials Sciences, Lawrence Berkeley National Laboratory and College of Chemistry, University of California, Berkeley, California 94720

Department of Chemistry, University of Otago, Dunedin, New Zealand

Freiburg Materials Research Center and Institute for Macromolecular Chemistry, University of Freiburg, Stefan-Meier-Str. 21, 79104 Freiburg, Germany

Department of Chemistry, University of Minnesota, Minneapolis, Minnesota 55455

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