journal article·2020-02

STRUCTURE OF Ge2Sb2Te5 THIN FILMS NEAR THE INFLECTION POINT OF THE RESISTIVITY TEMPERATURE DEPENDENCE

National Research University of Electronic Technology, Zelenograd 124498, Russia, Y. ZAYTSEVA, P. LAZARENKO, National Research University of Electronic Technology, Zelenograd 124498, Russia, YU. VOROBYOV, bRyazan State Radio Engineering University, Ryazan 390005, Russia, A. YAKUBOV, National Research University of Electronic Technology, Zelenograd 124498, Russia, N. BORGARDT, National Research University of Electronic Technology, Zelenograd 124498, Russia, S. KOZYUKHIN, Kurnakov Institute of General and Inorganic Chemistry, RAS, Moscow 119991, Russia, A. SHERCHENKOV, National Research University of Electronic Technology, Zelenograd 124498, Russia

Chalcogenide Letters· Volume 17· Issue 2
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Abstract

We investigated Ge2Sb2Te5 thin films annealed at the temperatures specific to the crystallization process using transmission electron microscopy. The annealing temperatures typical for the inflection point (168 °C) of the temperature dependence of resistivity and at the end of the crystallization process (183 °С) were chosen for the TEM studies. These studies clearly showed that the inflection point on the temperature dependence of resistivity is identified with a two-stage character of Ge2Sb2Te5 thin films crystallization.
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Research context

OpenAlex topics: Phase-change materials and chalcogenides · Chalcogenide Semiconductor Thin Films · Chemical Thermodynamics and Molecular Structure

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