The Coalescence Behavior of Two-Dimensional Materials Revealed by Multiscale In Situ Imaging during Chemical Vapor Deposition Growth
Abstract
Research context
OpenAlex topics: Graphene research and applications · 2D Materials and Applications · Ga2O3 and related materials
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Affiliations
Scientific Center for Optical and Electron Microscopy, ETH Zürich, 8093 Zürich, Switzerland
Department of Inorganic Chemistry, Fritz Haber Institute of the Max Planck Society, Berlin-Dahlem D-14195, Germany
School of Materials Science and Engineering and Department of Chemistry, Ulsan National Institute of Science and Technology (UNIST), Ulsan 44919, Republic of Korea
Department of Chemistry, University of Illinois at Chicago, Chicago, Illinois 60607, United States
Kamerlingh Onnes Laboratory, Leiden University, P.O. Box 9504, 2300 RA Leiden, The Netherlands
Vacuum Interconnected Nanotech Workstation, Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of Sciences, Suzhou 215123, China
State Key Laboratory of Catalysis, Dalian Institute of Chemical Physics, Chinese Academy of Sciences, Dalian 116023, China
Institute of Functional Nano & Soft Materials (FUNSOM), Collaborative Innovation Center of Suzhou Nano Science and Technology, Soochow University, Suzhou 215123, Jiangsu, China
State Key Laboratory for Mesoscopic Physics, Collaborative Innovation Centre of Quantum Matter, School of Physics, Peking University, Beijing 100871, China
Chemical Physics of Materials and Catalysis, Faculty of Sciences, Université Libre de Bruxelles, CP243, 1050 Brussels, Belgium
Department of Colloid Chemistry, Max Planck Institute of Colloids and Interfaces, Potsdam D-14424, Germany
Funding
Ministry of Science and Technology of the People's Republic of China · Natural Science Foundation of Jiangsu Province · Wallonie-Bruxelles International · Institute for Basic Science · Fonds De La Recherche Scientifique - FNRS · Central Committee of the Communist Party of China