journal article·2021-12

Investigation of the physical properties of nanostructured CO:NiO thin films

LEVRES Laboratory, University of El Oued, B.P. 789 39000 El Oued, ALGERIA, M. Ghougali, O. Belahssen, Physics Laboratory of Thin Films and Applications (LPCMA), University of Biskra, B.P. 145 R.P 07000 Biskra, ALGERIA, S. Benhamida, LRPPS Laboratory, Faculty of Mathematics and Matter Sciences, Kasdi Merbah University, 30000, Ouargla, Algeria, M. Mimouni, LEVRES Laboratory, University of El Oued, B.P. 789 39000 El Oued, ALGERIA, G. Rihia, LEVRES Laboratory, University of El Oued, B.P. 789 39000 El Oued, ALGERIA, M. S. Mahboub, LEVRES Laboratory, University of El Oued, B.P. 789 39000 El Oued, ALGERIA, A. Beggas, LEVRES Laboratory, University of El Oued, B.P. 789 39000 El Oued, ALGERIA

Chalcogenide Letters· Volume 18· Issue 12
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Abstract

In this paper, the Co:NiO thin films were deposited on glass substrates under the temperature of (480°C) by spray pyrolysis technique )SPT), and their structural, electrical and optical properties were studied. The films prepared with a molar concentration of 0.2 mol/l from solutions of nickel nitrate and cobalt (II) chloride hexahydrate. The XRD results showed that the films have a fcc structure with preferred orientation (111). The optical band gap energy and Urbach energy were found ranging between 3.61 to 3.48 eV and 0.353 to 0.915 eV respectively. The maximum value of electrical conductivity was 0.08961 Ω-1.cm-1, it was obtained at 12 at.%.
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Research context

OpenAlex topics: Transition Metal Oxide Nanomaterials · Gas Sensing Nanomaterials and Sensors

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