journal article·2014-02-25

Energy-Band Engineering for Tunable Memory Characteristics through Controlled Doping of Reduced Graphene Oxide

Su-Ting Han, Ye Zhou, Qing Dan Yang, Li Zhou, Long-Biao Huang, Yan Yan, Chun-Sing Lee, Vellaisamy A. L. Roy

ACS Nano· Volume 8· Issue 2
Publisher page

Abstract

Tunable memory characteristics are used in multioperational mode circuits where memory cells with various functionalities are needed in one combined device. It is always a challenge to obtain control over threshold voltage for multimode operation. On this regard, we use a strategy of shifting the work function of reduced graphene oxide (rGO) in a controlled manner through doping gold chloride (AuCl3) and obtained a gradient increase of rGO work function. By inserting doped rGO as floating gate, a controlled threshold voltage (Vth) shift has been achieved in both p- and n-type low voltage flexible memory devices with large memory window (up to 4 times for p-type and 8 times for n-type memory devices) in comparison with pristine rGO floating gate memory devices. By proper energy band engineering, we demonstrated a flexible floating gate memory device with larger memory window and controlled threshold voltage shifts.
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: Advanced Memory and Neural Computing · Graphene research and applications · 2D Materials and Applications

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Department of Physics and Materials Science and Center of Super-Diamond and Advanced Films (COSDAF), City University of Hong Kong, Hong Kong, Hong Kong SAR,

Shenzhen Research Institute, City University of Hong Kong, High-tech Zone, Nanshan District, Shenzhen, China 518057

References (47)

Show source-provided references
1. Kim S.-J. · Nano Lett. · 2010 · 10 · 288410.1021/nl1009662 ↗
2. Lee J.-S. · Adv. Mater. · 2009 · 21 · 17810.1002/adma.200800340 ↗
3. Hong A. J. · ACS Nano · 2011 · 5 · 781210.1021/nn201809k ↗
4. Chang H.-C. · Adv. Funct. Mater. · 2013 · 23 · 496010.1002/adfm.201300283 ↗
5. Han S.-T. · Adv. Mater. · 2013 · 25 · 87210.1002/adma.201203509 ↗
6. Han S.-T. · Adv. Mater. · 2012 · 24 · 355610.1002/adma.201201195 ↗
7. Han S.-T. · Adv. Mater. · 2013 · 25 · 542510.1002/adma.201301361 ↗
8. Tseng C.-W. · ACS Appl. Mater. Interfaces · 2013 · 5 · 952810.1021/am4023253 ↗
9. Tseng C.-W. · J. Am. Chem. Soc. · 2009 · 131 · 1244110.1021/ja904882m ↗
10. Lee J.-S. · Nat. Nanotechnol. · 2007 · 2 · 79010.1038/nnano.2007.380 ↗
11. Han S.-T. · J. Mater. Chem. · 2011 · 21 · 1457510.1039/c1jm12113h ↗
12. Lee J.-S. · Adv. Mater. · 2011 · 23 · 206410.1002/adma.201004150 ↗
13. Talapin D. V. · Chem. Rev. · 2009 · 110 · 38910.1021/cr900137k ↗
14. Huang X. · Chem. Soc. Rev. · 2012 · 41 · 66610.1039/C1CS15078B ↗
15. Stephan O. · Science · 1994 · 266 · 168310.1126/science.266.5191.1683 ↗
16. Panchakarla L. S. · Adv. Mater. · 2009 · 21 · 472610.1002/adma.200901285 ↗
17. Kwon K. C. · J. Mater. Chem. C · 2013 · 1 · 25310.1039/C2TC00008C ↗
18. Shi Y. · ACS Nano · 2010 · 4 · 268910.1021/nn1005478 ↗
19. Kwon K. C. · Adv. Funct. Mater. · 2012 · 22 · 472410.1002/adfm.201200997 ↗
20. Das A. · Nat. Nanotechnol. · 2008 · 3 · 21010.1038/nnano.2008.67 ↗
21. Kang B. · Adv. Mater. · 2013 · 25 · 585610.1002/adma.201302358 ↗
22. Novoselov K. S. · Science · 2004 · 306 · 66610.1126/science.1102896 ↗
23. Park J. K. · Nano Lett. · 2011 · 11 · 538310.1021/nl202983x ↗
24. Jeong H. Y. · Nano Lett. · 2010 · 10 · 438110.1021/nl101902k ↗
25. Yu W. J. · Adv. Mater. · 2011 · 23 · 188910.1002/adma.201004444 ↗
26. Chen Y. · Chem. Soc. Rev. · 2012 · 41 · 468810.1039/c2cs35043b ↗
27. Sun G. · Angew. Chem., Int. Ed. · 2013 · 52 · 1335110.1002/anie.201306770 ↗
28. Liu J. · Adv. Mater. · 2013 · 25 · 23310.1002/adma.201203349 ↗
29. Liu J. · ACS Nano · 2010 · 4 · 398710.1021/nn100877s ↗
30. Yin Z. · Small · 2013 · 9 · 72710.1002/smll.201201940 ↗
31. Liu J. · Small · 2010 · 6 · 153610.1002/smll.201000328 ↗
32. Hummers W. S. · J. Am. Chem. Soc. · 1958 · 80 · 133910.1021/ja01539a017 ↗
33. Li D. · Nat. Nanotechnol. · 2008 · 3 · 10110.1038/nnano.2007.451 ↗
34. Shan B. · Phys. Rev. Lett. · 2005 · 94 · 23660210.1103/PhysRevLett.94.236602 ↗
35. Kim S. Y. · Jpn. J. Appl. Phys. · 2011 · 50 · 10160210.1143/JJAP.50.101602 ↗
36. Seo J. H. · Adv. Mater. · 2009 · 21 · 100610.1002/adma.200802420 ↗
37. Braun S. · Adv. Mater. · 2009 · 21 · 145010.1002/adma.200802893 ↗
38. Myung S. · Adv. Mater. · 2010 · 22 · 204510.1002/adma.200903267 ↗
39. Kim S.-J. · Appl. Phys. Lett. · 2010 · 96 · 03330210.1063/1.3297878 ↗
40. Zhou Y. · Nanotechnology · 2012 · 23 · 34401410.1088/0957-4484/23/34/344014 ↗
41. Leong W. L. · J. Mater. Chem. · 2011 · 21 · 520310.1039/c0jm03974h ↗
42. Kim T.-W. · Appl. Phys. Lett. · 2010 · 97 · 02331010.1063/1.3464292 ↗
43. Collier C. P. · Annu. Rev. Phys. Chem. · 1998 · 49 · 37110.1146/annurev.physchem.49.1.371 ↗
44. Baeg K.-J. · Adv. Funct. Mater. · 2010 · 20 · 22410.1002/adfm.200901677 ↗
45. Kim S. M. · ACS Nano · 2012 · 6 · 787910.1021/nn302193q ↗
46. Rani A. · Appl. Phys. Lett. · 2012 · 101 · 23330810.1063/1.4769990 ↗
47. Zhou Y. · J. Mater. Chem. · 2012 · 22 · 1424610.1039/c2jm31813j ↗