Er3+-doped SiO2-TeO2-ZnO-Na2O thin film fabricated by ultrafast laser plasma doping under different ambient atmospheres
Source abstract
Abstract
Er3+-ions doped SiO2-ZnO-Na2O thin films were fabricated using ultrafast laser plasma doping (ULPD) techniques under different ambient atmospheres; vacuum, nitrogen, oxygen and argon gas. The thickness of the layer produced depends on the ambient atmosphere during fabrication. The layer fabricated under a vacuum is the thinnest among all of the samples. In addition, the surface layer for the sample fabricated under a vacuum environment seems to be relatively smoother compared with those of the others. XRD patterns show that all samples are in a mixed amorphous-crystalline phase. All the Raman spectra exhibited a similar pattern, except for the intensity of the Si peak which depended on the thickness of the obtained layer. The PL intensity for each sample corresponds to the amount of Er3+ ions embedded in the doped layer. However, all samples still exhibited silicate-based characteristics, indicating nitrogen in Si3N4 was lost in the form of nitrogen gas during fabrication.
Source: crossref · Quality: baseline
Research context
OpenAlex topics: Silicon Nanostructures and Photoluminescence · Glass properties and applications · Thin-Film Transistor Technologies
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (28)
Show source-provided references
1. [1] Kamil S A, Chandrappan J, Krauss T F, Jose G, J. Optoelectron. Adv. M. 21(11-12), 710 (2019).
2. [2] Kamil S A and Jose G 2020 Nanomaterials. 12 919; https://doi.org/10.3390/nano1206091910.3390/nano12060919 ↗
3. [3] Chandrappan J, Murray M, Petrik P, Agocs E, Zolnai Z, Tempez A et al 2015 Opt. Mater. Express. 5 2849; https://doi.org/10.1364/OME.5.00284910.1364/OME.5.002849 ↗
4. [4] Chandrappan J, Murray M, Kakkar T, Petrik P, Agocs E and Zolnai Z 2015 Sci. Rep. 5 14037; https://doi.org/10.1038/srep1403710.1038/srep14037 ↗
5. [5] Kamil S A, Chandrappan J, Portoles J, Steenson P and Jose G 2019 Mater. Res. Express. 6 086220; https://doi.org/10.1088/2053-1591/ab28eb10.1088/2053-1591/ab28eb ↗
6. [6] Kamil S A, Chandrappan J, Murray M, Steenson P, Krauss T F and Jose G 2016 Opt. Lett. 41 4684; https://doi.org/10.1364/OL.41.00468410.1364/OL.41.004684 ↗
7. [7] Gamaly E G, Rode A V, Luther-Davies B and Tikhonchuk V T 2002 Phys. Plasmas. 9 949; https://doi.org/10.1063/1.144755510.1063/1.1447555 ↗
8. [8] Dlamini S T S, Swart H C, Terblans J J and Ntwaeaborwa O M 2013 Solid State Sci. 23 65; https://doi.org/10.1016/j.solidstatesciences.2013.06.00910.1016/j.solidstatesciences.2013.06.009 ↗
9. [9] Marozau I, Shkabko A, Döbeli M, Lippert T, Logvinovich D and Mallepell M et al 2009 Materials 2 1388; https://doi.org/10.3390/ma203138810.3390/ma2031388 ↗
10. [10] Kek R, Yap S L, Koh S F, Nee C H, Tou T Y and Yap S S 2020 Thin Solid Films 701 137953; https://doi.org/10.1016/j.tsf.2020.13795310.1016/j.tsf.2020.137953 ↗
11. [11] Boffoué M O, Lenoir B, Scherrer H and Dauscher A 1998 Thin Solid Films 322 132; https://doi.org/10.1016/S0040-6090(97)00912-710.1016/S0040-6090(97)00912-7 ↗
12. [12] Hasabeldaim E, Ntwaeaborwa O M, Kroon R E, Motaung D E, Coetsee E and Swart H C 2017 Opt. Mater. 74 76; https://doi.org/10.1016/j.optmat.2017.04.06110.1016/j.optmat.2017.04.061 ↗
13. [13] Ojeda G P A, Schneider C W, Döbeli M, Lippert T and Wokaun A 2017 J. Appl. Phys. 121 135306; https://doi.org/10.1063/1.497978010.1063/1.4979780 ↗
14. [14] Chen X, Xiong S, Sha Z and Liu Z 1997 Appl. Surf. Sci. 115 279; https://doi.org/10.1016/S0169-4332(96)01087-210.1016/S0169-4332(96)01087-2 ↗
15. [15] Haile H T and Dejene F B 2020 Mater. Res. Express 7 076406; https://doi.org/10.1088/2053-1591/ab88fd10.1088/2053-1591/ab88fd ↗
16. [16] Chen T, Li X M, Zhang S and Zeng H R 2004 J. Cryst. Growth. 270 553; https://doi.org/10.1016/j.jcrysgro.2004.07.02110.1016/j.jcrysgro.2004.07.021 ↗
17. [17] Coetsee E, Terblans J J and Swart H C 2009 Phys. B 404 4431; https://doi.org/10.1016/j.physb.2009.09.04610.1016/j.physb.2009.09.046 ↗
18. [18] Martín-Sánchez J, Chahboun A, Pinto S R C, Rolo A G, Marques L, Serna R et al 2013 Appl. Phys. A Mater. Sci. Process 110 585; https://doi.org/10.1007/s00339-012-7131-z10.1007/s00339-012-7131-z ↗
19. [19] Ghoshal S K, Awang A, Sahar M.R and Arifin R 2015 J. Lumin. 159 265; https://doi.org/10.1016/j.jlumin.2014.11.03210.1016/j.jlumin.2014.11.032 ↗
20. [20] Dousti M R, Sahar M R, Amjad R J, Ghoshal S K and Awang A 2013 J. Lumin. 143 368; https://doi.org/10.1016/j.jlumin.2013.04.01710.1016/j.jlumin.2013.04.017 ↗
21. [21] Seuthe T, Grehn M, Mermillod-Blondin A, Eichler H J, Bonse J and Eberstein M 2013 Opt. Mater. Express. 3 755; https://doi.org/10.1364/OME.3.00075510.1364/OME.3.000755 ↗
22. [22] Suresh B, Zhydachevskii Y, Brik M G, Suchocki A and Reddy M S 2016 J. Alloys Compd. 683 114; https://doi.org/10.1016/j.jallcom.2016.05.05610.1016/j.jallcom.2016.05.056 ↗
23. [23] Bourhis K, Shpotyuk Y, Massera J, Aallos V, Jouan T, Boussard-plédel C et al 2014 Opt. Mater. 37 87; https://doi.org/10.1016/j.optmat.2014.05.00410.1016/j.optmat.2014.05.004 ↗
24. [24] Robinet L, Coupry C, Eremin K and Hall C 2006 J. Raman Spectrosc. 37 787 https://doi.org/10.1002/jrs.154910.1002/jrs.1549 ↗
25. [25] McMillan P 1984 Am. Mineral. 69 622
26. [26] Cui J and Hope G A 2015 J. Spectrosc. 2015 940172
27. [27] Polman A 1997 Appl. Phys. Rev. 82 1; https://doi.org/10.1063/1.36626510.1063/1.366265 ↗
28. [28] Snoeks E, Kik P G and Polman A 1996 Opt. Mater. 5 159; https://doi.org/10.1016/0925-3467(95)00063-110.1016/0925-3467(95)00063-1 ↗