Generation of Monolayer Gradients in Surface Energy and Surface Chemistry for Block Copolymer Thin Film Studies
Source abstract
Abstract
We utilize a vapor deposition setup and cross-diffusion of functionalized chlorosilanes under dynamic vacuum to generate a nearly linear gradient in surface energy and composition on a silicon substrate. The gradient can be tuned by manipulating chlorosilane reservoir sizes and positions, and the gradient profile is independent of time as long as maximum coverage of the substrate is achieved. Our method is readily amenable to the creation of gradients on other substrate surfaces, due to the use of vapor deposition, and with other functionalities, due to our use of functionalized chlorosilanes. Our gradients were characterized using contact angle measurements and X-ray photoelectron spectroscopy. From these measurements, we were able to correlate composition, contact angle, and surface energy. We generated a nearly linear gradient with a range in mole fraction of one component from 0.15 to 0.85 (34 to 40 mJ/m(2) in surface energy) to demonstrate its utility in a block copolymer thin film morphology study. Examination of the copolymer thin film surface morphology with optical and atomic force microscopy revealed the expected morphological transitions across the gradient.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Block Copolymer Self-Assembly · Semiconductor materials and devices · Polymer Surface Interaction Studies
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Department of Chemical Engineering, University of Delaware, Newark, Delaware 19716,
Polymers Division, National Institute of Standards and Technology, Gaithersburg, Maryland 20899
References (34)
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