Low-Frequency Current Fluctuations in “Graphene-like” Exfoliated Thin-Films of Bismuth Selenide Topological Insulators
Source abstract
Abstract
We report on the low-frequency current fluctuations and electronic noise in thin-films made of Bi(2)Se(3) topological insulators. The films were prepared via the "graphene-like" mechanical exfoliation and used as the current conducting channels in the four- and two-contact devices. The thickness of the films ranged from ∼50 to 170 nm to avoid hybridization of the top and bottom electron surface states. Analysis of the resistance dependence on the film thickness indicates that the surface contribution to conductance is dominant in our samples. It was established that the current fluctuations have the noise spectrum close to the pure 1/f in the frequency range from 1 Hz to 10 kHz (f is the frequency). The relative noise amplitude S(I)/I(2) for the examined Bi(2)Se(3) films was increasing from ∼5 × 10(-8) to 5 × 10(-6) (1/Hz) as the resistance of the channels varied from ∼10(3) to 10(5) Ω. The obtained noise data is important for understanding electron transport through the surface and volume of topological insulators, and proposed applications of this class of materials. The results may help to develop a new method of noise reduction in electronic devices via the "scattering immune" transport through the surface states.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Topological Materials and Phenomena · Graphene research and applications · 2D Materials and Applications
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Nano-Device Laboratory, Department of Electrical Engineering and Materials Science and Engineering Program, Bourns College of Engineering, University of California−Riverside, Riverside, California, 92521, United States
Department of Electrical, Computer and Systems Engineering and Center for Integrated Electronics, Rensselaer Polytechnic Institute, Troy, New York, 12180, United States
Ioffe Physical-Technical Institute, Russian Academy of Sciences, St. Petersburg, 194021 Russia
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