Nonlinear Phenomena in Multiferroic Nanocapacitors: Joule Heating and Electromechanical Effects
Source abstract
Abstract
We demonstrate an approach for probing nonlinear electromechanical responses in BiFeO(3) thin film nanocapacitors using half-harmonic band excitation piezoresponse force microscopy (PFM). Nonlinear PFM images of nanocapacitor arrays show clearly visible clusters of capacitors associated with variations of local leakage current through the BiFeO(3) film. Strain spectroscopy measurements and finite element modeling point to significance of the Joule heating and show that the thermal effects caused by the Joule heating can provide nontrivial contributions to the nonlinear electromechanical responses in ferroic nanostructures. This approach can be further extended to unambiguous mapping of electrostatic signal contributions to PFM and related techniques.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Ferroelectric and Piezoelectric Materials · Force Microscopy Techniques and Applications · Mechanical and Optical Resonators
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
The Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831, United States
Korea Research Institute of Standards and Science (KRISS), Daejeon 305-340, Korea
Max Planck Institute of Microstructure Physics, D-06120 Halle (Saale), Germany
References (46)
Show source-provided references
1. Ahn C. H. · Science · 1997 · 276 · 110010.1126/science.276.5315.1100 ↗
2. Tanaka K. · Jpn. J. Appl. Phys. · 2008 · 47 · 331110.1143/JJAP.47.3311 ↗
3. Scott J. F. · 200010.1007/978-3-662-04307-3 ↗
4. Waser R. · 200410.1002/3527604650 ↗
5. Stolichnov I. · J. Appl. Phys. · 1998 · 84 · 321610.1063/1.368888 ↗
6. Stolichnov I. · Appl. Phys. Lett. · 1999 · 75 · 179010.1063/1.124821 ↗
7. Baniecki J. D. · Appl. Phys. Lett. · 2002 · 81 · 383710.1063/1.1519359 ↗
8. Baniecki J. D. · J. Appl. Phys. · 2003 · 94 · 674110.1063/1.1620377 ↗
9. Meyer R. · Appl. Phys. Lett. · 2005 · 86 · 11290410.1063/1.1874313 ↗
10. Blom P. W. M. · Phys. Rev. Lett. · 1994 · 73 · 210710.1103/PhysRevLett.73.2107 ↗
11. Kohlstedt H. · Phys. Rev. B · 2005 · 72 · 12534110.1103/PhysRevB.72.125341 ↗
12. Seidel J. · Nat. Mater. · 2009 · 8 · 22910.1038/nmat2373 ↗
13. Maksymovych P. · Science · 2009 · 324 · 142110.1126/science.1171200 ↗
14. Alexe M. · Appl. Phys. Lett. · 1999 · 75 · 179310.1063/1.124822 ↗
15. Bdikin I. K. · Appl. Phys. Lett. · 2003 · 83 · 423210.1063/1.1627476 ↗
16. Gruverman A. · Rep. Prog. Phys. · 2006 · 69 · 244310.1088/0034-4885/69/8/R04 ↗
17. Seidel J. · Phys. Rev. Lett. · 2010 · 105 · 19760310.1103/PhysRevLett.105.197603 ↗
18. Maksymovych P. · Nano Lett. · 2011 · 11 · 190610.1021/nl104363x ↗
19. Farokhipoor, S.; Noheda, B.Conduction through 71o Domain Walls in BiFeO3Thin Films. DOI:arXiv:1104.3267v1.
20. Gruverman A. · Nano Lett. · 2009 · 9 · 353910.1021/nl901754t ↗
21. Garcia V. · Science · 2010 · 327 · 110610.1126/science.1184028 ↗
22. Pantel D. · ACS Nano · 2011 · 5 · 603210.1021/nn2018528 ↗
23. Yu H. Y. · IEEE Trans. Electron Devices · 2004 · 51 · 60910.1109/TED.2004.825110 ↗
24. Jiang Q. Y. · J. Appl. Phys. · 1994 · 75 · 743310.1063/1.356637 ↗
25. Kalinin S. V. · J. Am. Ceram. Soc. · 2005 · 88 · 107710.1111/j.1551-2916.2005.00383.x ↗
26. Balke N. · J. Am. Ceram. Soc. · 2009 · 92 · 162910.1111/j.1551-2916.2009.03240.x ↗
27. Morozovska A. N. · J. Appl. Phys. · 2007 · 102 · 07410510.1063/1.2785824 ↗
28. Morozovska A. N. · Phys. Rev. B · 2007 · 75 · 17410910.1103/PhysRevB.75.174109 ↗
29. Scrymgeour D. A. · Phys. Rev. B · 2005 · 72 · 02410310.1103/PhysRevB.72.024103 ↗
30. Guyonnet J. · Appl. Phys. Lett. · 2009 · 95 · 13290210.1063/1.3226654 ↗
31. Agronin A. · J. Appl. Phys. · 2005 · 97 · 08431210.1063/1.1861515 ↗
32. Bintachitt P. · Proc. Natl. Acad. Sci. U.S.A. · 2010 · 107 · 721910.1073/pnas.0913172107 ↗
33. Jesse S. · Nanotechnology · 2007 · 18 · 43550310.1088/0957-4484/18/43/435503 ↗
34. Harnagea C. · IEEE Trans. Ultrason., Ferroelectr., Frequency Control · 2006 · 53 · 230910.1109/TUFFC.2006.179 ↗
35. Kim Y. · J. Appl. Phys. · 2010 · 108 · 04200510.1063/1.3474960 ↗
36. Kim, Y.; Kumar, A.; Ovchinnikov, O.; Jesse, S.; Han, H.; Pantel, D.; Vrejoiu, I.; Lee, W.; Hesse, D.; Alexe, M.et al.Unpublished.
37. Wang D. · J. Appl. Phys. · 1998 · 83 · 534210.1063/1.367362 ↗
38. Yuan G. L. · Appl. Phys. Lett. · 2004 · 84 · 95410.1063/1.1644056 ↗
39. Yimnirun R. · Appl. Phys. Lett. · 2007 · 90 · 11290610.1063/1.2713336 ↗
40. Pabst G. W. · Appl. Phys. Lett. · 2007 · 90 · 07290210.1063/1.2535663 ↗
41. Kim Y. · Appl. Phys. Lett. · 2010 · 96 · 20290210.1063/1.3431585 ↗
42. Lee W. · Nat. Nanotechnol. · 2008 · 3 · 40210.1038/nnano.2008.161 ↗
43. Kim Y. · Nano Lett. · 2010 · 10 · 126610.1021/nl9038339 ↗
44. Albrecht T. R. · J. Appl. Phys. · 1991 · 69 · 66810.1063/1.347347 ↗
45. Harnagea C. · Appl. Phys. A: Mater. Sci. Process. · 2000 · 70 · 26110.1007/s003390050045 ↗
46. Cahill D. G. · Rev. Sci. Instrum. · 1990 · 61 · 80210.1063/1.1141498 ↗