journal article·2026-07Open access

A Bilayer Rare‐Earth/High‐κ Oxide Memristor for Energy‐Efficient Neuromorphic Intelligence

Hammad Ghazanfar, Muhammad Rabeel, Honggyun Kim, Sobia Nisar, Muhammad Wajid Zulfiqar, Muneeb Ahmad, Rana Faryad Ali, Ghulam Dastgeer, Deok‐kee Kim

Small· Volume 22· Issue 38

Abstract

ABSTRACT The growing demand for brain‐inspired computing systems has intensified research into energy‐efficient, scalable, and adaptive hardware that mimics biological synaptic behavior. Neuromorphic memristor devices, which integrate memory and processing functionalities within a single nanoscale unit, are emerging as promising building blocks for next‐generation artificial intelligence systems. In this work, we demonstrate a CMOS‐compatible Ag/Gd 2 O 3 /HfO 2 /Pt bilayer memristor engineered with atomically sharp interfaces and optimized defect landscapes to achieve stable and efficient resistive switching behavior. The device exhibits excellent performance, including an ON/OFF current ratio exceeding 10 7 , retention beyond 10 4 s, a sub‐microsecond switching transition time (350 ns), and low programming energy of just 13.6 pJ. Interface engineering effectively stabilizes multilevel conductance states, suppresses stochastic filament growth, and supports analog long‐term potentiation and depression. Incorporating the experimentally measured synaptic plasticity into convolutional neural network simulations yields a 78% classification accuracy on the Fashion‐MNIST dataset, along with robust color recognition. These results demonstrate, as a device‐level proof of concept, that bilayer rare‐earth/high‐κ oxide memristors can inform the development of future non‐volatile memory and low‐power edge neuromorphic systems.
Source: crossref · Quality: baseline

Research context

OpenAlex topics: Advanced Memory and Neural Computing · Ferroelectric and Negative Capacitance Devices · Transition Metal Oxide Nanomaterials

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Department of Semiconductor Systems Engineering Sejong University Seoul Republic of Korea

Department of Electrical Engineering and Convergence Engineering for Intelligent Drone Sejong University Seoul Republic of Korea

Department of Optical Engineering Sejong University Seoul Republic of Korea

Department of Materials Science and Engineering and Materials Research Laboratory Massachusetts Institute of Technology (MIT) Cambridge Massachusetts USA

Department of Physics and Astronomy Sejong University Seoul Republic of Korea

Funding

National Research Foundation of Korea · Ministry of Science and ICT, South Korea

References (67)

Show source-provided references
1. 10.1002/adfm.20251876410.1002/adfm.202518764 ↗
2. 10.1038/s41467‐024‐55094‐010.1038/s41467‐024‐55094‐0 ↗
3. 10.1039/D4TA05024J10.1039/D4TA05024J ↗
4. 10.1002/aelm.20230038810.1002/aelm.202300388 ↗
5. 10.1109/TIM.2025.357034710.1109/TIM.2025.3570347 ↗
6. 10.1109/TPEL.2025.359596110.1109/TPEL.2025.3595961 ↗
7. 10.1038/s41467‐024‐46372‐y10.1038/s41467‐024‐46372‐y ↗
8. 10.1016/j.nanoen.2023.10910610.1016/j.nanoen.2023.109106 ↗
9. 10.1109/TCPMT.2025.356602610.1109/TCPMT.2025.3566026 ↗
10. 10.1016/j.mssp.2024.10911110.1016/j.mssp.2024.109111 ↗
11. 10.1002/adfm.20252066510.1002/adfm.202520665 ↗
12. 10.3390/sym1708125210.3390/sym17081252 ↗
13. 10.1016/j.mtphys.2025.10192910.1016/j.mtphys.2025.101929 ↗
14. 10.1007/s42114‐025‐01545‐110.1007/s42114‐025‐01545‐1 ↗
15. 10.1039/D5TC01467K10.1039/D5TC01467K ↗
16. 10.1038/s41528‐024‐00356‐610.1038/s41528‐024‐00356‐6 ↗
17. 10.1002/smll.20250820810.1002/smll.202508208 ↗
18. 10.1038/s41467‐024‐48908‐810.1038/s41467‐024‐48908‐8 ↗
19. 10.1002/adma.20231147210.1002/adma.202311472 ↗
20. 10.1016/j.jcis.2026.13994310.1016/j.jcis.2026.139943 ↗
21. 10.1063/1.511553110.1063/1.5115531 ↗
22. 10.1016/j.jmst.2021.04.02510.1016/j.jmst.2021.04.025 ↗
23. 10.1021/acsaelm.3c0013110.1021/acsaelm.3c00131 ↗
24. 10.1016/j.vlsi.2025.10247510.1016/j.vlsi.2025.102475 ↗
25. 10.1016/j.chaos.2025.11729210.1016/j.chaos.2025.117292 ↗
26. 10.1038/s41586‐025‐08733‐510.1038/s41586‐025‐08733‐5 ↗
27. 10.1002/adfm.20210713110.1002/adfm.202107131 ↗
28. 10.1109/TCAD.2024.351133510.1109/TCAD.2024.3511335 ↗
29. 10.1016/j.mtphys.2025.10176310.1016/j.mtphys.2025.101763 ↗
30. 10.1063/5.000779310.1063/5.0007793 ↗
31. 10.1109/TCSI.2025.358390210.1109/TCSI.2025.3583902 ↗
32. 10.1016/j.jsamd.2021.08.00210.1016/j.jsamd.2021.08.002 ↗
33. 10.1021/acsaelm.5c0040310.1021/acsaelm.5c00403 ↗
34. 10.1038/ncomms491910.1038/ncomms4919 ↗
35. 10.1007/s11664‐022‐10136‐510.1007/s11664‐022‐10136‐5 ↗
36. 10.3390/app1503157310.3390/app15031573 ↗
37. 10.1016/j.physb.2020.41206510.1016/j.physb.2020.412065 ↗
38. 10.3390/molecules2612371510.3390/molecules26123715 ↗
39. C.Han M.Zhang Y.Liu X.Wang H.Zhang andY. I.Tong Interface Engineering Induced Digital to Analog Switching Transition in Hafnium Oxide‐Based Memory Device 2025 9th IEEE Electron Devices Technology & Manufacturing Conference (EDTM)(IEEE 2025) 1–3 https://doi.org/10.1109/EDTM61175.2025.11041024.10.1109/EDTM61175.2025.11041024 ↗
40. 10.1016/j.jmat.2024.07.00710.1016/j.jmat.2024.07.007 ↗
41. Manohara B. · 2020 · 44
42. 10.1021/acsomega.9b0428410.1021/acsomega.9b04284 ↗
43. 10.1002/jrs.98010.1002/jrs.980 ↗
44. 10.1016/j.mtla.2024.10206410.1016/j.mtla.2024.102064 ↗
45. 10.1016/j.jallcom.2023.16890010.1016/j.jallcom.2023.168900 ↗
46. 10.1016/j.jmst.2023.03.03910.1016/j.jmst.2023.03.039 ↗
47. 10.1016/j.apsusc.2023.15834510.1016/j.apsusc.2023.158345 ↗
48. 10.1016/j.apsusc.2024.16107310.1016/j.apsusc.2024.161073 ↗
49. 10.1063/5.022717010.1063/5.0227170 ↗
50. 10.1016/j.jallcom.2022.16426210.1016/j.jallcom.2022.164262 ↗
51. 10.1016/j.apsadv.2021.10011210.1016/j.apsadv.2021.100112 ↗
52. 10.1038/nmat475610.1038/nmat4756 ↗
53. 10.1016/j.nanoen.2024.11040110.1016/j.nanoen.2024.110401 ↗
54. 10.1002/adfm.20241081010.1002/adfm.202410810 ↗
55. 10.1016/j.jallcom.2025.18589510.1016/j.jallcom.2025.185895 ↗
56. 10.1016/j.jcis.2021.08.10910.1016/j.jcis.2021.08.109 ↗
57. 10.1016/j.sna.2025.11631610.1016/j.sna.2025.116316 ↗
58. 10.3389/fnano.2025.165017410.3389/fnano.2025.1650174 ↗
59. 10.1002/aelm.20240000810.1002/aelm.202400008 ↗
60. 10.1021/acsmaterialslett.4c0040610.1021/acsmaterialslett.4c00406 ↗
61. 10.1063/5.023706310.1063/5.0237063 ↗
62. 10.1016/j.jallcom.2024.17388910.1016/j.jallcom.2024.173889 ↗
63. 10.1016/j.cej.2025.16629210.1016/j.cej.2025.166292 ↗
64. 10.1016/j.measurement.2025.11696010.1016/j.measurement.2025.116960 ↗
65. 10.1021/acsanm.5c0122310.1021/acsanm.5c01223 ↗
66. 10.1016/j.jallcom.2024.17703210.1016/j.jallcom.2024.177032 ↗
67. 10.1002/adfm.20251473210.1002/adfm.202514732 ↗