Impact of Native Point Defects on Elastic Properties of GaN Nanowires
Source abstract
Abstract
Abstract Native point defects can significantly affect the optical and electrical properties of GaN nanowires. However, how they change the mechanical performance remains unclear. Here, elastic properties of c ‐axis GaN nanowires with different native point defects concentrations have been quantitatively studied. GaN nanowires with a higher point defects density demonstrate lower Young's modulus and fracture strength as well as noticeable time‐dependent anelastic behavior under the stress gradient. Whereas, the “cleaner” nanowires are much stronger and remain elastic without detectable hysteresis. Photoluminescence spectroscopy analysis indicates that the dominant point defects in the unintentionally doped GaN nanowires are Ga vacancies and the complex with O atoms at N sites. The observed “smaller‐is‐stronger” size effect aligns with the size‐dependent point defect density in both types of nanowires. This work may clarify the longstanding inconsistencies regarding the elastic properties of GaN nanowires and serve as an example of how mechanical behaviors can be tailored through defect engineering.
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Research context
OpenAlex topics: GaN-based semiconductor devices and materials · Ga2O3 and related materials · ZnO doping and properties
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Center for Advancing Materials Performance from the Nanoscale (CAMP‐Nano) & Hysitron Applied Research Center in China (HARCC) State Key Laboratory for Mechanical Behavior of Materials Xi'an Jiaotong University Xi'an 710049 P. R. China
Funding
National Key Research and Development Program of China
References (47)
Show source-provided references
1. Wu Z. · Opt. Express · 2024 · 32
2. 10.1016/j.ultramic.2023.11371310.1016/j.ultramic.2023.113713 ↗
3. 10.1007/s12274-022-4080-510.1007/s12274-022-4080-5 ↗
4. 10.1038/s41928-021-00550-810.1038/s41928-021-00550-8 ↗
5. 10.1016/j.apmt.2020.10085810.1016/j.apmt.2020.100858 ↗
6. 10.1038/s41467‐018‐06140‐110.1038/s41467‐018‐06140‐1 ↗
7. 10.1016/j.matdes.2016.02.05010.1016/j.matdes.2016.02.050 ↗
8. Kim D. · Adv. Funct. Mater. · 2024 · 34
9. Park B. · Adv. Sci. · 2022 · 9
10. 10.1007/s12274-022-4403-610.1007/s12274-022-4403-6 ↗
11. 10.1039/D1TC04022G10.1039/D1TC04022G ↗
12. 10.1021/nl048777410.1021/nl0487774 ↗
13. 10.1021/nl034003w10.1021/nl034003w ↗
14. 10.1038/nmat72810.1038/nmat728 ↗
15. 10.1103/PhysRevLett.86.334810.1103/PhysRevLett.86.3348 ↗
16. 10.1063/5.000477110.1063/5.0004771 ↗
17. 10.1126/science.277.5334.197110.1126/science.277.5334.1971 ↗
18. Jung K. · J. Appl. Phys. · 2012 · 112
19. 10.1088/0256-307X/28/6/06620110.1088/0256-307X/28/6/066201 ↗
20. 10.1557/jmr.2006.035010.1557/jmr.2006.0350 ↗
21. 10.1021/nl103450e10.1021/nl103450e ↗
22. 10.1103/PhysRevB.76.04531010.1103/PhysRevB.76.045310 ↗
23. Tanner S. M. · Appl. Phys. Lett. · 2007 · 91
24. 10.1002/pssc.20067384810.1002/pssc.200673848 ↗
25. 10.1088/0957-4484/18/13/13570810.1088/0957-4484/18/13/135708 ↗
26. 10.1002/adfm.20050080710.1002/adfm.200500807 ↗
27. 10.1021/nl501986d10.1021/nl501986d ↗
28. 10.1088/0957-4484/27/47/47570110.1088/0957-4484/27/47/475701 ↗
29. 10.1021/acs.nanolett.5b0285210.1021/acs.nanolett.5b02852 ↗
30. 10.1111/j.1551-2916.2006.01193.x10.1111/j.1551-2916.2006.01193.x ↗
31. 10.1021/acs.nanolett.6b0360410.1021/acs.nanolett.6b03604 ↗
32. 10.1016/j.jcrysgro.2012.07.02510.1016/j.jcrysgro.2012.07.025 ↗
33. 10.1021/nl060553t10.1021/nl060553t ↗
34. 10.1063/1.12273510.1063/1.122735 ↗
35. 10.1038/srep0265710.1038/srep02657 ↗
36. 10.1063/1.186805910.1063/1.1868059 ↗
37. 10.1063/1.175765410.1063/1.1757654 ↗
38. 10.1038/s41598‐017‐08570‐110.1038/s41598‐017‐08570‐1 ↗
39. 10.1103/PhysRevLett.79.303010.1103/PhysRevLett.79.3030 ↗
40. 10.1021/nl903517t10.1021/nl903517t ↗
41. 10.1021/acs.nanolett.9b0416410.1021/acs.nanolett.9b04164 ↗
42. 10.1038/nnano.2015.13510.1038/nnano.2015.135 ↗
43. 10.1017/CBO978051181094710.1017/CBO9780511810947 ↗
44. 10.1103/PhysRevLett.21.89110.1103/PhysRevLett.21.891 ↗
45. 10.1039/C3CE42266F10.1039/C3CE42266F ↗
46. Ryu J. H. · Appl. Phys. Lett. · 2012 · 100
47. 10.1021/acsnano.7b0141710.1021/acsnano.7b01417 ↗