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journal article·2025-01Open access

Measurement and Analysis of Surface Temperature Gradients on Magnetron Sputtered Thin Film Growth Studied Using NiCr/NiSi Thin Film Thermocouples (Small 1/2025)

Zhihui Liu, Yumeng Yang, Yi Sun, Tengda Guo, Kai Shen, Yongjun Cheng, Bi Wang, Kai Hu, Chuanbing Zhang, Gang Hao, Jiankang Zhou, Mengxuan Wu, Baoli Cui, Wanyu Ding, Zixi Wang

Small· Volume 21· Issue 1
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Source abstract

Abstract

Thin Film Growth In article number 2404829, Wanyu Ding, Zixi Wang, and co-workers established a three-layer NiCr/NiSi thin-film thermocouple temperature measurement system in TiO2 film growth processes, to measure the temperature gradient from TiO2 film growth surface to substrate. The temperature of substrate was about 132.05 °C, while the temperature difference between TiO2 film growth surface and substrate could reach to was about 144.71 °C.
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Research context

OpenAlex topics: Advanced Sensor Technologies Research · nanoparticles nucleation surface interactions · Advancements in Materials Engineering

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Affiliations

College of Materials Science and Engineering Dalian Jiaotong University Dalian 116028 China

State Key Laboratory of Tribology in Advanced Equipment Tsinghua University Beijing 100084 China

School of Mechanical Engineering Suzhou University of Science and Technology Suzhou Jiangsu 215009 China

Laboratory of Low Frequency Electromagnetic Communication Technology with the 722 Research Institute CSSC Wuhan 430200 China

State Key Laboratory of High‐end Compressor and System Technology Hefei Anhui 230031 China

References

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