journal article·2023-06Open access

Free‐Standing Molecularly Thin Amorphous Silica Nanosheets (Small 22/2023)

Eisuke Yamamoto, Kosuke Fujihara, Yuma Takezaki, Kentaro Ito, Yue Shi, Makoto Kobayashi, Minoru Osada

Small· Volume 19· Issue 22

Abstract

Amorphous Silica Nanosheets In article number 2300022, Eisuke Yamamoto, Minoru Osada, and co-workers establish a chemical protocol for free-standing molecularly thin nanosheets; solid-state surfactant lamellae can serve as templates guiding amorphous silica nanosheets. Exfoliation of the lamellar hybrids with ordered alkyl-chain arrangement allows into free-standing amorphous silica nanosheets with 0.9 nm in thickness. In addition, the nanosheets show high colloidal stability that enables atomic layer engineering of film with a low leakage current density.
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Research context

OpenAlex topics: Mesoporous Materials and Catalysis · Catalytic Processes in Materials Science · Polyoxometalates: Synthesis and Applications

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Affiliations

Department of Materials Chemistry & Institute of Materials and Systems for Sustainability (IMaSS) Nagoya University Nagoya 464–8601 Japan

Precursory Research for Embryonic Science and Technology (PRESTO) Japan Science and Technology Agency (JST) Saitama 332‐0012 Japan

International Center for Materials Nanoarchitectonics (WPI‐MANA) National Institute for Materials Science (NIMS) Tsukuba 305‐0044 Japan

References

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