DataVXSmallPaper
journal article·2020-04Open access

Wet Etching: Controlling the Facet of ZnO during Wet Chemical Etching Its (0001¯) O‐Terminated Surface (Small 14/2020)

Mei Sun, Bocheng Yu, Mengyu Hong, Zhiwei Li, Fengjiao Lyu, Xing Li, Zhihong Li, Xianlong Wei, Zheng Zhang, Yue Zhang, Qing Chen

Small· Volume 16· Issue 14
Publisher pageOpen full text
Source abstract

Abstract

In article number 1906435, Qing Chen and co-workers obtain high-index {01 1 ¯ 3 ¯ } facets of ZnO during wet chemical etching of the (000 1 ¯ ) O-terminated surface of ZnO and also provide the direct experimental evidence of the micromasking mechanism for the hillocks formation via an in situ liquid cell transmission electron microscopy study.
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: ZnO doping and properties

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Key Laboratory for the Physics and Chemistry of Nanodevices Department of Electronics Peking University Beijing 100871 China

National Key Laboratory of Science and Technology on Micro/Nano Fabrication Institute of Microelectronics Peking University Beijing 100871 China

Beijing Advanced Innovation Center for Materials Genome Engineering Beijing Key Laboratory for Advanced Energy Materials and Technologies University of Science and Technology Beijing Beijing 100083 China

Henan Key Laboratory of Diamond Optoelectronic Materials and Devices Key Laboratory of Material Physics Ministry of Education School of Physics and Microelectronics Zhengzhou University Zhengzhou 450052 China

References

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